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Prospectus
We
are commencing the operation of the MIT CIPS working group
that explores the application drivers, manufacturing processes,
device and materials design for large area optical and electrical
integration.
To
date, large area optoelectronic integration has been dominated
by flat-panel display applications, namely LCD and plasma
displays. Further scaling of these and other large area technologies
will be enabled by cost reduction in the rapid throughput
roll-to-roll manufacturing or similar reproduction advances.
At preset, roll-to-roll manufacturing is limited to applications
requiring low pattern density such as flexible solar cells,
batteries, antennas for RFID tags, and electronic paper. The
true manufacturing revolution awaits development of a rapid,
additive, high resolution patterning/deposition process, which
enables integration of dissimilar material sets into an integrated
optoelectronic platform. The
working group will explore new applications drivers as well
as robust manufacturing paradigms for large area integration.
The working group is expected
to provide a forum for interaction among university and industry,
researchers and practitioners, representing different perspectives
across the value chain, to accomplish the following goals:
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Identify
the applications that will drive the development of large
area optoelectronic technologies, and the potential material
sets compatible with the large area substrates;
Identify
the large area optoelectronic manufacturing methods and
integrated processes that enable high yield manufacturing;
Identify
and examine potential barriers to technology deployment;
Develop
consensus among stakeholders across the value chain on
the nature of those barriers, including consideration
of technology and business models;
Raise
awareness of the barriers identified by working group
consensus, through a series of "executive white papers" to be disseminated among the broader research and development
community;
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Facilitate
solutions, through research and discussion among university,
industry and practitioners.
Working
group activities will be organized around a year-long monthly
seminar series that addresses a set of pertinent topics. Each
seminar will be followed by an in-depth discussion of the
working group participants. The regular monthly interaction
will allow for continued development of ideas, where by the
end of the year the effort will generate comprehensive understanding
of the Large Area Optical and Electronic Integration topic.
Examples of the seminar topics include:
Patterned
Materials over Large Areas
Techniques
and limitations to accurate alignment over large areas
Active
Devices on Large Substrates
Optical
and electronic device adaptation to large area integration
Materials
for Flexible Substrates
Passive
and active materials limitations on flexible substrates
Roll-to-Roll
Processing
Machine
tooling, design, and process-flow for roll-to-roll processing
Fiber-Processing
Alternative
substrates for large area processing
Process-flow
for Large Area Device Integration
Process compatibility and design flow
Novel
Applications
Application
drivers for developing techniques of large area integration
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Meetings
March 5, 2007
Integrated
Large Area Electronics Workshop
2006
June
28
Michael
Randolph, MIT
R2R
Manufacturing
Thesis
and Seminar
June
1
Joe
Carr, pSi Technologies
Seminar
May
4
CIPS Annual Mtg. presentations
on
Advance Display Tech
May
3
Integrated
Large Area Electronics Workshop
Flexible
and R2R Electronics Presentations
April
6
Michael
D McCreary, E Ink
Seminar
February
28
John
Rogers, Univ. of Illinois
Seminar
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