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It’s a fine line: New method could lead to narrower chip patterns

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Researchers at MIT have found a novel method for etching extremely narrow lines on a microchip, using a material that can be switched from transparent to opaque, and vice versa, just by exposing it to certain wavelengths of light. <<more>>

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It’s a fine line: New method could lead to narrower chip patterns

Professor Henry I. Smith

RLE NanoStructures Laboratory