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Journal Articles

  1.     H.I. Smith and M.S. Gussenhoven, “Adhesion of Polished Quartz Crystals under Ultrahigh Vacuum”, J. Appl. Phys. 36, 2326-2327 (1965).

  2.     H.I. Smith, “Optical-Contact Bonding”, J. Acoust. Soc. Amer. 37, 928-929 (1965).

  3.     H. Van de Vaart and H.I. Smith, “High Efficiency Polarization Reversal of Magnetoelastic Waves in YIG by Optical-Contact Bonding of YAG Disks”, Appl. Phys. Lett. 9, 439-441 (1966).

  4.     H.I. Smith and A.B. Smith, “Transmission of Gigahertz Ultrasonic Waves through Optical-Contact Bonds at Room Temperature”, J. Acoust. Soc. Amer. 44, 1737-1738 (1968).

  5.     H.I. Smith, “Methods for Fabricating High Frequency Surface Wave Transducers”, Rev. Sci. Inst. 40, 729-730 (1969).

  6.     H.I. Smith, “The Physics and Technology of Surface Elastic Waves”, International Journal of Nondestructive Testing 2, 31-59 (1970).

  7.     B.E. Burke, A. Bers, H.I. Smith, R.A. Cohen, and R.W. Mountain, “Acoustic Surface Wave Amplification using an Accumuation Layer on Silicon”, Proc. IEEE 58, 1775-1776 (1970).

  8.     H.I. Smith, F.J. Bachner, and N. Efremow, “A High-Yield Photolithographic Technique for Surface Wave Devices”, J. Electrochem. Soc. 118, 821-825 (1971).

  9.     D.L. Spears and H.I. Smith, “High-Resolution Pattern Replication using Soft X-rays”, Electronics Lett. 8, 102-104 (1972).

10.     D.L. Spears and H.I. Smith, “X-ray Lithography:  A New High Resolution Replication Process”, Solid State Technol. 15, No. 7, 21-26 (1972).

11.     R.C. Williamson and H.I. Smith, “Large-Time-Bandwidth-Product Surface-Wave Pulse Compressor Employing Reflective Gratings”, Electronics Lett. 8, No. 16, 401-402 (1972).

12.     R.C. Williamson and H.I. Smith, “The use of Surface-Elastic-Wave Reflection Gratings in Large Time-Bandwidth Pulse-Compression Filters”, IEEE Trans. Microwave Theory and Techniques MTT-21, 195-205 (1973).

13.     H.I. Smith, D.L. Spears, and S.E. Bernacki, “X-ray Lithography:  A Complementary Technique to Electron Beam Lithography”, J. Vac. Sci. Technol. 10, 913-917 (1973).

14.     R.J. Hawryluk, A.M. Hawryluk, and H.I. Smith, “Energy Dissipation in a Thin Polymer Film by Electron Beam Scattering”, J. Appl. Phys. 45, 2551-2556 (1974).

15.     H.I. Smith, “Fabrication Techniques for Surface-Acoustic Wave and Thin-Film Optical Devices”, Proc. IEEE 62, 1361-1387 (1974).

16.     H.I. Smith, “Electron Beam, X-ray, and Optical Techniques for Fabricating Surface-Acoustic-Wave and Thin-Film Optical Devices”, LeVide 29, No. 173, 364-370 (1974).

17.     H.I. Smith, N. Efremow, and P.L. Kelly, “Photolithographic Contact Printing of 4000Å Linewidth Patterns”, J. Electrochem. Soc. 121, 1503-1506 (1974).

18.     R.J. Hawryluk, H.I. Smith, A. Soares, and A.M. Hawryluk, “Energy Dissipation in a Thin Polymer Film by Electron Beam Scattering-Experiment”, J. Appl. Phys. 46, 2528-2537 (1975).

19.     S.E. Bernacki and H.I. Smith, “Fabrication of Silicon MOS Devices using X-ray Lithography”, IEEE Trans. Elec. Dev. ED22, 421-428 (1975).

20.     J. Melngailis, H.I. Smith, and N. Efremow, “Instrumentation for Conformable Photomask Lithography”, IEEE Trans. Elec. Dev. ED22, 496-498 (1975).

21.     H.I. Smith, S.R. Chinn, and P.D. DeGraff, “Application of Moiré Techniques in Scanning Electron Beam Lithography and Microscopy”, J. Vac. Sci. Technol. 12, 1262-1265 (1975).

22.     H.I. Smith and S.E. Bernacki, “Prospects for X-ray Fabrication of Silicon IC Devices”, J. Vac. Sci. Technol. 12, 1321-1323 (1975).

23.     S.E. Bernacki and H.I. Smith, “Fabrication of Silicon MOS Devices using X-ray Lithography”, (in Japanese), Nikkei Electronics 1-12, 139-157 (1976).

24.     H.I. Smith and D.C. Flanders, “X-ray Lithography”, Japan J. Appl. Phys. 16, Supplement 16‑1, 61-65 (1977).

25.     D.C. Flanders, H.I. Smith, and S. Austin, “A New Interferometric Alignment Technique”, Appl. Phys. Lett. 31, 426-428 (1977).

26.     D.C. Flanders, H.I. Smith, H.W. Lehmann, R. Widmer, and D.C. Shaver, “Surface Relief Structures with Linewidths Below 2000Å”, Appl. Phys. Lett. 32, 112-114 (1978).

27.     N.M. Ceglio and H.I. Smith, “Micro Fresnel Zone Plates for Coded Imaging Applications”, Rev. Sci. Instr. 49, 15-20 (1978).

28.     H.I. Smith and D.C. Flanders, “Oriented Crystal Growth on Amorphous Substrates using Artificial Surface-Relief Gratings”, Appl. Phys. Lett. 32, 349-350 (1978).

29.     D.C. Flanders, D.C. Shaver, and H.I. Smith, “Alignment of Liquid Crystals using Submicrometer Periodicity Gratings”, Appl. Phys. Lett. 32, 597-598 (1978).

30.     S. Austin, H.I. Smith, and D.C. Flanders, “Alignment of X-ray Lithography Masks using a New Interferometric Technique – Experimental Results”, J. Vac. Sci. Technol. 15, 984 (1978).

31.     D.C. Flanders and H.I. Smith, “Polyimide Membrane X-ray Lithography Masks – Fabrication and Distortion Measurements”, J. Vac. Sci. Technol. 15, 995-997 (1978).

32.     D.C. Flanders and H.I. Smith, “Surface Relief Gratings of 3200Å-Period-Fabrication and Influence on Thin-Film Growth”, J. Vac. Sci. Technol. 15, 1001 (1978).

33.     M.W. Geis, D.C. Flanders, and H.I. Smith, “Crystallographic Orientation of Silicon on an Amorphous Substrate using an Artificial Surface-Relief Grating and Laser Crystallization”, Appl. Phys. Lett. 35, 71 (1979).

34.     J. Melngailis, H.A. Haus, and A. Lattes, “Efficient Conversion of Surface Acoustic Waves in Shallow Gratings to Bulk Plate Modes”, Appl. Phys. Lett. 35, 324 (1979).

35.     D.C. Shaver, D.C. Flanders, N.M. Ceglio, and H.I. Smith, “X-ray Zone Plates Fabricated using Electron-Beam and X-ray Lithography”, J. Vac. Sci. Technol. 16, 1626 (1979).

36.     M.W. Geis, D.C. Flanders, H.I. Smith, and D.A. Antoniadis, “Graphoepitaxy of Silicon on Fused Silica using Surface Micropatterns and Laser Crystallization”, J. Vac. Sci. Technol. 16, 1640 (1979).

37.     D.C. Flanders, A.M. Hawryluk, and H.I. Smith, “Spatial-Period-Division – A New Technique for Exposing Submicrometer-Linewidth Periodic and Quasi-Periodic Patterns”, J. Vac. Sci. Technol. 16, 1949 (1979).

38.     H.I. Smith and D.C. Flanders, “X-ray Lithography – A Review and Assessment of Future Applications”, J. Vac. Sci. Technol. 17, 533 (1980).

39.     M.W. Geis, D.A. Antoniadis, D.J. Silversmith, R.W. Mountain, and H.I. Smith, “Silicon Graphoepitaxy using a Strip-Heater Oven”, Appl. Phys. Lett. 37, 454 (1980).

40.     H.A. Haus, A. Lattes, and J. Melngailis, “Grating Coupling Between Surface Acoustic Waves and Plate Modes”, IEEE Trans. Sonics and Ultrasonics SU27, 258 September 1980.

41.     H.V. Kanel and J.D. Litster, “Light Scattering Studies on Single-Layer Smectic p‑Butoxybenzilidene p-Octylaniline”, Phys. Rev. A 23, 3251 (1981).

42.     M.W. Geis, D.A. Antoniadis, D.J. Silversmith, R.W. Mountain, and H.I. Smith, “Silicon Graphoepitaxy”, J. Vac. Sci. Technol. 18, 229 (1981).

43.     H.V. Kanel, J.D. Litster, J. Melngailis, and H.I. Smith, “Alignment of Nematic Butoxybenzilidene Octylaniline by Surface Relief Gratings”, Phys. Rev. A 24, 2713 (l98l).

44.     N.M. Ceglio, C.F. Stone, and A.M. Hawryluk, “Microstructures for High Energy X-ray and Particle Imaging Applications”, J. Vac. Sci. Technol. 19, 886 (1981).

45.     A.M. Hawryluk, N.M. Ceglio, R.H. Price, J. Melngailis, and H.I. Smith, “Gold Transmission Gratings with Submicrometer Periods and Thicknesses > 0.5 µm”, J. Vac. Sci. Technol. 19, 897 (1981).

46.     N. Tsumita, J. Melngailis, A.M. Hawryluk, and H.I. Smith, “Fabrication of X-ray Masks using Anisotropic Etching of (110) Si and Shadowing Techniques”, J. Vac. Sci. Technol. 19, 1211 (1981).

47.     N.N. Efremow, N.P. Economou, K. Bezjian, S.S. Dana, and H.I. Smith, “A Simple Technique for Modifying the Profile of Resist Exposed by Holographic Lithography”, J. Vac. Sci. Technol. 19, 1234 (1981).

48.     C.M. Horowitz and J. Melngailis, “Reactive Sputter Etching of Si, SiO2, Cr, Al, and Other Materials with Gas Mixtures Based on CF4 and Cl2”, J. Vac. Sci. Technol. 19, 1408 (1981).

49.     P.F. Liao, J.G. Bergman, D.S. Chemla, A. Wokaun, J. Melngailis, A.M. Hawryluk, and N.P. Economou, “Surface Enhanced Raman Scattering from Microlithographic Silver Particle Surfaces”, Chem. Phys. Lett. 82, (2), 355 (1981).

50.     C.M. Horwitz, “Reactive Sputter Etching of Silicon with Very Low Mask-Material Etch Rates”, IEEE Trans. Elect. Devices ED28, 1320 (198l).

51.     M.W. Geis, H.I. Smith, B.-Y. Tsaur, J.C.C. Fan, E.W. Maby, and D.A. Antoniadis, “Zone-Melting Recrystallization of Encapsulated Silicon Films on SiO2- Morphology and Crystallography”, Appl. Phys. Lett. 40, 158 (1982).

52.     R.J. Hawryluk, A.M. Hawryluk, and H.I. Smith, “Addendum:  New Model of Electron Free Path in Multiple Layers for Monte Carlo Simulation”, J. Appl. Phys. 53, 5985 (1982).

53.     K.A. Bezjian, H.I. Smith, J.M. Carter, and M.W. Geis, “An Etch Pit Technique for Analyzing Crystallographic Orientation in Si Films”, J. Electrochem. Soc. 129, 1848 (1982).

54.     A.M. Hawryluk, H.I. Smith, R.M. Osgood, and D.J. Ehrlich, “Deep-UV Spatial Period Division using An Excimer Laser”, Optics Letters 7, 402 (1982).

55.     M.W. Geis, H.I. Smith, B.-Y. Tsaur, J.C.C. Fan, D.J. Silversmith, and R.W. Mountain, “Zone Melting Recrystallization of Si Films with a Movable-Strip-Heater Oven”, J. Electrochem. Soc. 129, 2812 (1982).

56.     H.A. Atwater, H.I. Smith, and M.W. Geis, “Orientation Selection by Zone-Melting Silicon Films through Planar Constrictions”, Appl. Phys. Lett. 41, 747 (1982).

57.     N.M. Ceglio, A.M. Hawryluk, and R.H. Price, “Imaging X-ray Spectrometer for Laser Fusion Applications”, Appl. Opt. 21, 3953-3960 (1981).

58.     M.W. Geis, H.I. Smith, D.J. Silversmith, R.W. Mountain, and C.V. Thompson, “Solidification-Front Modulation to Entrain Subboundaries in Zone Melting Recrystallization of Si on SiO2”, J. Electrochem. Soc. 130, 1178 (1983).

59.     C.M. Horwitz, “New Dry Etch for Al and Al-Cu-Si Alloy:  Reactively Masked Sputter Etching with SiF4”, Appl. Phys. Lett. 42, 898 (1983).

60.     E.W. Maby, H.A. Atwater, A.L. Keigler, and N.M. Johnson, “Electron-Beam-Induced Current Measurements in Silicon-on-Insulator Films Prepared by Zone-Melting Recrystallization”, Appl. Phys. Lett. 43, 482 (1983).

61.     C.M. Horwitz, “RF Sputtering-Voltage Division Between Two Electrodes”, J. Vac. Sci. Technol. A 1, 60 (1983).

62.     H.I. Smith, C.V. Thompson, M.W. Geis, R.A. Lemons, and M.A. Bosch, “The Mechanism of Orientation in Si Graphoepitaxy by Laser or Strip-Heater Recrystallization”, J. Electrochem. Soc. 130, 2050 (1983).

63.     H.I. Smith, M.W. Geis, C.V. Thompson, and H.A. Atwater, “Silicon-on-Insulator by Graphoepitaxy and Zone-Melting Recrystallization of Patterned Films”, J. Crystal Growth, 63, 527 (1983).

64.     C.M. Horwitz, “Hollow Cathode Reactive Sputter Etching – A New High-Rate Process”, Appl. Phys. Lett. 43, 977 (1983).

65.     E.H. Anderson, C.M. Horwitz, and H.I. Smith, “Holographic Lithography with Thick Photoresist”, Appl. Phys. Lett. 43, 874 (1983).

66.     A.M. Hawryluk, H.I. Smith, and D.J. Ehrlich, “Deep UV Spatial-Frequency Doubling by Combining Multilayer Mirrors with Diffraction Gratings”, J. Vac. Sci. Technol. B 1, 1200 (1983).

67.     H.J. Lezec, E.H. Anderson, and H.I. Smith, “An Improved Technique for Resist-Profile Control in Holographic Lithography”, J. Vac. Sci. Technol. B 1, 1204 (1983).

68.     N.M. Ceglio, A.M. Hawryluk, and M.L. Schattenburg, “X-ray Phase Lens Design and Fabrication”, J. Vac. Sci. Technol. B 1, 1285 (1983).

69.     H.A. Atwater, C.V. Thompson, H.I. Smith, and M.W. Geis, “Orientation Filtering by Growth-Velocity Competition in Zone-Melting Recrystallization of Silicon on SiO2”, Appl. Phys. Lett. 43, 1126 (1983).

70.     C.M. Horwitz, “Radio Frequency Sputtering – The Significance of Power Input”, J. Vac. Sci. Technol. A 1, 1795 (1983).

71.     H.I. Smith, C.V. Thompson, and H.A. Atwater, “Graphoepitaxy and Zone-Melting Recrystallization of Patterned Films”, J. Cryst. Growth 65, 337 (1983).

72.     C.J. Keavney and H.I. Smith, “A 3.8 µm Period Sawtooth Grating in InP by Anisotropic Etching”, J. Electrochem. Soc. 131, 452 (1984).

73.     R.F. Kwasnick, M.A. Kastner, J. Melngailis, and P.A. Lee, “Non-Monotonic Variations of the Conductance with Electron Density in ~70 nm Wide Inversion Layers”, Phys. Rev. Lett. 52, 224 (1984).

74.     C.V. Thompson and H.I. Smith, “Surface-Energy-Driven Secondary Grain Growth in Ultrathin (<100 nm) Films of Silicon”, Appl. Phys. Lett. 44, 603 (1984).

75.     H.A. Atwater, H.I. Smith, C.V. Thompson, and M.W. Geis, “Zone-Melting Recrystallization of Thick Silicon on Insulator Films”, Mater. Lett. 2, 269 (1984).

76.     T. Yonehara, H.I. Smith, C.V. Thompson, and J.E. Palmer, “Graphoepitaxy of Ge on SiO2 by Solid-State Surface-Energy-Driven Grain Growth”, Appl. Phys. Lett. 45, 631 (1984).

77.     M.L. Schattenburg, I. Plotnik, and H.I. Smith, “Reactive-Ion Etching of 0.2 µm Period Gratings in Tungsten and Molybdenum using CBrF3”, J. Vac. Sci. Technol. B 3, 272 (1985).

78.     A.C. Warren, D.A. Antoniadis, H.I. Smith, and J. Melngailis, “Surface Superlattice Formation in Silicon Inversion Layers using 0.2 µm-Period Grating-Gate Electrodes”, IEEE Elect. Dev. Lett. EDL-6, 294 (1985).

79.     G.G. Shahidi, E.P. Ippen, and J. Melngailis, “Submicron-Gap High-Mobility Silicon Picosecond Photodetectors”, Appl. Phys. 58, 763 (1985).

80.     C.V. Thompson, “Secondary Grain Growth in Thin Films of Semiconductors:  Theoretical Aspects”, J. Appl. Phys. 58, 763 (1985).

81.     S.Y. Chou, H.I. Smith, and D.A. Antoniadis, “X-ray Lithography for Sub-100 nm Channel Length Transistors using Masks Fabricated with Conventional Photolithography, Anisotropic Etching and Oblique Shadowing”, J. Vac. Sci. Technol. B 3, 1587 (1985).

82.     J.C. Licini, D.J. Bishop, M.A. Kastner, and J. Melngailis, “Aperiodic Magnetoresistance Oscillations in Narrow Inversion Layers in Si”, Phy. Dev. Lett. 55, 2987 (1985).

83.     S.Y. Chou, D.A. Antoniadis, and H.I. Smith, “Observation of Electron Velocity Overshoot in Sub-100 nm-Channel MOSFETs in Si”, IEEE Elect. Dev. Lett. EDL-6, 665 (1985).

84.     H.I. Smith, “A Statistical Analysis of UV, X-ray and Charged-Particle Lithographies”, J. Vac. Sci. Technol. B 4, 148 (1986).

85.     S.Y. Chou, H.I. Smith, and D.A. Antoniadis, “Sub-100 nm Channel-Length Transistors Fabricated using X-ray Lithography”, J. Vac. Sci. Technol. B 4, 253 (1986).

86.     A.C. Warren, I. Plotnik, E.H. Anderson, M.L. Schattenburg, D.A. Antoniadis, and H.I. Smith, “Fabrication of Sub-100 nm Linewidth Periodic Structures for Study of Quantum Effects from Interference and Confinement in Si Inversion Layers”, J. Vac. Sci. Technol. B 4, 365 (1986).

87.     C.C. Wong, H.I. Smith, and C.V. Thompson “Surface-Energy-Driven Secondary Grain Growth in Thin Au Films”, Appl. Phys. Lett. 48, 335 (1986).

88.     H.-J. Kim, C.V. Thompson, “Compensation of Grain Growth Enhancement in Doped Silicon Films”, Appl. Phys. Lett. 48, 399 (1986).

89.     A.C. Warren, D.A. Antoniadis, and H.I. Smith, “Quasi One-Dimensional Conduction in Multiple, Parallel Inversion Lines”, Phys. Rev. Lett. 56, 1858 (1986).

90.     S.Y. Chou and D.A. Antoniadis “Relationship Between Measured and Intrinsic Transconductances of FETs”, IEEE Trans. Electron Devices ED-34, 448 (1987).

91.     M.W. Geis, H.I. Smith, and C.K. Chen, “Characterization and Entrainment of Subboundaries and Defect Trails in Zone-Melting-Recrystallized Si Films”, J. Appl. Phys. 60, 1152 (1986).

92.     H.I. Smith, “A Review of Submicron Lithography”, Superlattices and Microstructures  2, 129 (1986).

93.     A.C. Warren, D.A. Antoniadis, and H.I. Smith, “Semi-Classical Calculation of Charge Distributions in Ultra-Narrow Inversion Lines”, IEEE Electron Device Letters EDL-7, 413 (1986).

94.     S.Y. Chou, D.A. Antoniadis, and H.I. Smith, “Application of the Shubnikov-de Haas Oscillations in Characterization of Si MOSFET’s and GaAs MODFET’s”, IEEE Trans. Elec. Dev. ED-34, 883 (1987).

95.     C.R. Canizares, H.V.D. Bradt, G.W. Clark, A.C. Fabian, P.C. Joss, A.M. Levine, W.H.G. Lewin, T.H. Market, W. Mayer, J.E. McClintock, S.A. Rappaport, G.R. Ricker, M.L. Schattenburg, H.I. Smith, and B.E. Woodgate, “The MIT Spectroscopy Investigation on AXAF and the Study of Supernova Remnants”, Astro. Lett. and Communications 26, 87 (1987).

96.     S.M. Garrison, R.C. Cammarata, C.V. Thompson, and H. I. Smith, “Surface-Energy-Driven Grain Growth during Rapid Thermal Annealing (< 10s) of Thin Silicon Films”, J. Appl. Phys. 61, 1652 (1987).

97.     S.Y. Chou, D.A. Antoniadis, H.I. Smith, and M.A. Kastner, “Conductance Fluctuations in Ultra-Short-Channel Si MOSFETs”, Solid State Communications 61, 571 (1987).

98.     M.A. Kastner, R.F. Kwasnick, J.C. Licini, and D.J. Bishop, “Conductance Fluctuations Near the Localized-to-Extended Transition in Narrow Si MOSFETs”, Phys. Rev. B 36, 8015 (1987).

99.     J.S. Im, H. Tomita, and C.V.Thompson, “Cellular and Dendritic Morphologies on Stationary and Moving Liquid-Solid Interfaces in Zone-Melting Recrystallization”, Appl. Phys. Lett. 51, 685 (1987).

100.     J. Palmer, C.V. Thompson, and H.I. Smith, “Grain Growth and Grain Size Distribution in Thin Germanium Films”, J. Appl. Phys. 62, 2492 (1987).

101.     G.G. Shahidi, D.A. Antoniadis, and H.I. Smith, “Observation of Electron Velocity Overshoot at Room and Liquid Nitrogen Temperatures in Silicon Inversion Layers”, IEEE Elect. Dev. Lett. EDL-9, 94 (1988).

102.     H.A. Atwater, C.V. Thompson, and H.I. Smith, “Interface-Limited Grain Boundary Motion during Ion Bombardment”, Phys. Rev. Lett. 60, 112 (1988).

103.     G.G. Shahidi, D.A. Antoniadis, and H.I. Smith, “Electron Velocity Overshoot in Sub-100 nm Channel Length MOSFETs at 77K and 300K”, J. Vac. Sci. Technol. B 6, 137 (1988).

104.     H.I. Smith, “A Model for Comparing Process Latitude in Ultraviolet, Deep-Ultraviolet and X-ray Lithography”, J. Vac. Sci. Technol. B 6, 346-349 (1988).

105.     E.H. Anderson, K. Komatsu, and H.I. Smith, “Achromatic Holographic Lithography in the Deep UV”, J. Vac. Sci. Technol. B 6, 216 (1988).

106.     Y.-C. Ku, E.H. Anderson, M.L. Schattenburg, and H.I. Smith, “Use of a Pi-Phase-Shifting X‑ray Mask to Increase the Intensity Slope at Feature Edges”, J. Vac. Sci. Technol. B 6, 150 (1988).

107.     G.G. Shahidi, D.A. Antoniadis, and H.I. Smith, “Reduction of Channel-Hot-Electron-Generated Substrate Current in Sub-150 nm Channel Length Si MOSFETs”, IEEE Elect. Dev. Lett. EDL-9, 497 (1988).

108.     K. Ismail, W. Chu, D.A. Antoniadis, and H.I. Smith, “Surface-Superlattice Effects in a Grating-Gate GaAs/GaA1As Modulation-Doped Field-Effect Transistor”, Appl. Phys. Lett. 52, 1071 (1988).

109.     M.A. Kastner, S.B. Field, J.C. Licini, and S.L.Park, “Anomalous Magnetoresistance of the Electron Gas in a Restricted Geometry”, Phys. Rev. Lett. 60, 2535 (1988).

110.     E.H. Anderson, A.M. Levine, and M.L. Schattenburg, “Transmission X-ray Diffraction Grating Alignment using a Photoelastic Modulator”, Appl. Opt. Lett. 27, 3522 (1988).

111.     H.A. Atwater, C.V. Thompson, and H.I. Smith, “Ion Bombardment Enhanced Grain Growth in Germanium, Silicon and Gold Thin Films”, J. Appl. Phys. 64, 2337 (1988).

112.     H.A. Atwater, C.V. Thompson, and H.I. Smith, “Mechanisms for Crystallographic Orientation in the Crystallization of Thin Silicon Films from the Melt”, J. Mat. Res. 3, 1232 (1988).

113.     D.W. Keith, M.L. Schattenburg, H.I. Smith, and D.E. Pritchard, “Diffraction of Atoms by a Transmission Grating”, Phys. Rev. Lett. 61, 1580-1583 (1988).

114.     H.A. Atwater and C.V. Thompson, “Point Defect Enhanced Grain Growth in Silicon Thin Films:  The Role of Ion Bombardment and Dopants”, Appl. Phys. Lett. 53, 2155 (1988).

115.     C. Ortiz, K.A. Rubin, and S. Ajuria, “Laser-Induced Multi- Crystallization Events of Thin Germanium Films”, J. Mat. Res. 3, 1196 (1988).

116.     K. Ismail, W. Chu, D.A. Antoniadis, and H.I. Smith, “Lateral-Surface Superlattice and Quasi-One-Dimensional GaAs/GaAlAs MODFETs Fabricated using X-ray and Deep-UV Lithography”, J. Vac. Sci. Technol. B 6, 1824 (1988).

117.     J.H.F. Scott-Thomas, M.A. Kastner, D.A. Antoniadis, H.I. Smith, and S. Field, “Si MOSFETs with 70 nm Slotted Gates for Study of Quasi-One-Dimensional Quantum Transport”, J. Vac. Sci. Technol. B 6, 1841 (1988).

118.     118   Y.C. Ku, H.I. Smith,and I. Plotnik, “Use of Ion Implantation to Eliminate Stress-Induced Distortion in X-ray Masks”, J. Vac. Sci. Technol. B 6, 2174  (1988).

119.     U. Meirav, M. Heiblum, and F. Stern, “High-Mobility Variable-Density Two-Dimensional Electron Gas in Inverted GaAs-AlGaAs Heterojunctions”, Appl. Phys. Lett. 52, 460-462 (1988).]

120.     K. Ismail, W. Chu, A. Yen, D.A. Antoniadis and H.I. Smith, “Negative Transconductance and Negative Differential Resistance in a Grid-Gate Modulation-Doped Field-Effect Transistor”, Appl. Phys. Lett. 54, 460 (1989).

121.     K. Ismail, D.A. Antoniadis, and H.I. Smith, “One-Dimensional Subbands and Mobility Modulation in GaAs/AlGaAs Quantum Wires”, Appl. Phys. Lett. 54, 1130 (1989).

122.     J.H.F. Scott-Thomas, S.B. Field, M.A. Kastner, H.I. Smith, and D.A. Antoniadis, “Conductance Oscillations Periodic in the Density of a One-Dimensional Electron Gas”, Phys. Rev. Lett. 62, 583 (1989).

123.     P.F. Bagwell and T.P. Orlando, “Landauer’s Conductance Formula and its Generalization to Finite Voltages”, Phys. Rev. B 40, 1456 (1989).

124.     P.F. Bagwell and T.P. Orlando, “Broadened Conductivity Tensor and Density of States for a Superlattice Potential in 1, 2, and 3 Dimensions”, Phys. Rev. B 40, 3735 (1989).

125.     C.T. Liu, K. Nakamura, D.C. Tsui, K. Ismail, D.A. Antoniadis, and H.I. Smith, “Magneto-Optics of a Quasi Zero-Dimensional Electron Gas”, Appl. Phy. Lett. 55, 168 (1989).

126.     K. Ismail, D.A. Antoniadis, and H.I. Smith, “Lateral Resonant Tunneling in a Double-Barrier Field-Effect Transistor”, Appl. Phys. Lett. 55, 589 (1989).

127.     [U. Meirav, M.A. Kastner, M. Heiblum, and S.J. Wind, “One-Dimensional Electron Gas in GaAs:  Periodic Conductance Oscillations as a Function of Density”, Phys. Rev. B 40, 5871 (1989).]

128.     W. Chu, A. Yen, K. Ismail, M.I. Shepard, H.J. Lezec, C.R. Musil, J. Melngailis, Y.-C. Ku, J.M. Carter, and H.I. Smith, “Sub-100 nm X-ray Mask Technology using Focused-Ion-Beam Lithography”, J. Vac. Sci. Technol. B 7, 1583-1585 (1989).

129.     A. Moel, M.L. Schattenburg, J.M. Carter, and H.I. Smith, “Microgap Control in X-ray Nanolithography”, J. Vac. Sci. Technol. B 7, 1692-1695 (1989).

130.     K. Ismail, W. Chu, R. Tiberio, A. Yen, H.J. Lezec, M.I. Shepard, C.R. Musil, J. Melngailis, D.A. Antoniadis, and H.I. Smith, “Resonant Tunneling Across and Mobility Modulation Along Surface-Structured Quantum Wells”, J. Vac. Sci. Technol. B 7, 2025-2029 (1989).

131.     K. Ismail, D.A. Antoniadis, H.I. Smith, C.T. Liu, K. Nakamura, and D.C. Tsui, “A Lateral-Surface Superlattice Structure on GaAs/AlGaAs for Far-Infrared and Magneto-Capacitance Measurements”, J. Vac. Sci. Technol. B 7, 2000-2002 (1989).

132      K. Ismail, T.P. Smith, III, W.T. Masselink and H. I. Smith, “Magnetic Flux Commensurability in Coupled Quantum Dots”, Appl. Phys. Lett. 55, 276 (1989).

132A  A. Kumar, S.E. Laux, and F. Stern, “Channel Sensitivity to Gate Roughness in a Split-gate GaAs-AlGaAs Heterostructure”, Appl. Phys. Lett. 54, 1270 (1989).

133.     C.T. Liu, K. Nakamura, D.C. Tsui, K. Ismail, D.A. Antoniadis, and H.I. Smith, “Far-Infrared Transmission Measurements on Grid-Gate GaAs/AlGaAs Lateral-Surface-Superlattice Structures”, J. Surface Science 228, 527 (1990).

134.     C.T. Liu, D.C. Tsui, M. Shayegan, K. Ismail, D.A. Antoniadis, and H.I. Smith, “Oscillatory Density-of-States of Landau Bands in a Two-Dimensional Lateral Surface Superlattice”, Solid State Communications 75, 395-399 (1990).

135.     C.V. Thompson, J. Floro, and H.I. Smith, “Epitaxial Grain Growth in Thin Metal Films”, J. Appl. Phys. 67, 4099-4104 (1990).

136.     M.L. Schattenburg, E.H. Anderson, and H.I. Smith, “X-ray/VUV Transmission Gratings for Astrophysical and Laboratory Applications”, Physica Scripta 41, 13-20 (1990).

137.     J.A. del Alamo and C.C. Eugster, “Quantum Field-Effect Directional Coupler”, Appl. Phys. Lett. 56, 78 (1990).]

138.     P.F. Bagwell, “Evanescent Modes and Scattering in Quasi-One-Dimensional Wires”, Phys. Rev. B 41, 354-371 (1990).

139.     P.F. Bagwell, “Solution of Dyson’s Equation in a Quasi-One-Dimensional Wire”, J. Phy. Condens. Matter 2, 6179 (1990).

140.     H.I. Smith and H.G. Craighead, “Nanofabrication”, Physics Today pp. 24-30 February (1990).

141.     H.I. Smith and D.A. Antoniadis, “Seeking a Radically New Electronics”, Technology Review 93, pp. 26-40 (1990).

142.     A. Toriumi, K. Ismail, M. Burkhardt, D.A. Antoniadis, and H.I. Smith, “Resonant Magneto-Capacitance in a Two-Dimensional Lateral-Surface Superlattice”, Phys. Rev. B 41, 12346-12349 (1990).

143.     S.B. Field, M.A. Kastner, U. Meirav, J.H.F. Scott-Thomas, D.A. Antoniadis, H.I. Smith, and S.J. Wind, “Conductance Oscillations Periodic in the Density of One-Dimensional Electron Gases”, Phys. Rev. B 42, 3523-3536 (1990).

144.     A. Kumar and P.F. Bagwell, “Resonant Tunneling in a Multi-Channel Wire”, Solid State Communications, 75, 949-953 (1990).

145.     P.F. Bagwell, T.P.E. Broekaert, T.P. Orlando, and C.G. Fonstad, “Resonant Tunneling Diodes and Transistors with a One-, Two-, or Three- Dimensional Electron Emitter”, J. Appl. Phys. 68, 4634-4646 (1990).

146.     [U. Meirav, M.A. Kastner, and S.J. Wind, “Single Electron Charging and Periodic Conductance Resonances in GaAs Nanostructures”, Phys. Rev. Lett. 65, 771-774 (1990).]

147.     M.L. Schattenburg, K. Early, Y.C. Ku, W. Chu, M.I. Shepard, S.C. The, H.I. Smith, D.W. Peters, R.D. Frankel, D.R. Kelly, and J.P. Drumheller, “Fabrication and Testing of 0.1 µm-Linewidth Microgap X-ray Masks”, J. Vac. Sci. Technol. B 8, 1604-1608 (1990).

148.     A. Moel, M.L. Schattenburg, J.M. Carter, and H.I. Smith, “A Compact, Low-Cost System for Sub-100 nm X-ray Lithography”, J. Vac. Sci. Technol. B 8, 1648-1651 (1990).

149.     [C.C. Eugster, J.A. del Alamo, and M.J. Rooks, “Transport in Novel Gated Quantum Wires:  The Impact of Wire Length”, Japanese J. Appl. Phys. 12, L2257-L2260 (1990).]

150.     [A. Kumar, S.E. Laux, and F. Stern, “Electron States in a GaAs Quantum Dot in a Magnetic Field”, Phys. Rev. B 42, 5166-5175 (1990).]

151.     K. Ismail, M. Burkhardt, H.I. Smith, N.H. Karam, and P.A. Sekula-Moise, “Patterning and Characterization of Large-Area Quantum-Wire Arrays”, Appl. Phys. Lett. 58, 1539-1541 (1991).

152.     A. Kumar and P.F. Bagwell, “Resonant Tunneling in a Quasi-One-Dimensional Wire:  Influence of Evanescent Modes”, Phys. Rev. B 43, 9012-9020 (l991).

153.     M.W. Geis, H. I. Smith, A. Argoitia, J. Angus, G.H.M. Ma, J.T. Glass, J. Butler, C.J. Robinson, and R. Pryor, “Large-Area Mosaic Diamond Films Approaching Single-Crystal Quality”, Appl. Phys. Lett. 58, 2485 (1991).

154.     C.T. Liu, D.C. Tsui, M. Shayegan, K. Ismail, D.A. Antoniadis, and H.I. Smith, “Guiding-Center-Drift Resonance of Two-Dimensional Electrons in a Grid-Gate Superlattice Potential”, Appl. Phys. Lett. 58, 2945-2947 (1991).

155.     N.H. Karam, A. Mastrovita, V. Haven, K. Ismail, S. Pennycock, and H.I. Smith, “Patterning and Overgrowth of Nanostructure Quantum Well Wire Arrays by LP-MOVPE”, J. Crystal Growth 107, 591-597 (1991).

156.     W. Chu, H.I. Smith, M.L. Schattenburg, “Replication of 50 nm Linewidth Device Patterns using Proximity X-ray Lithography at Large Gaps”, Appl. Phys. Lett. 59, 1641-1643 (1991).

157.     K. Ismail, P.F. Bagwell, T.P. Orlando, D.A. Antoniadis, and H.I. Smith, “Quantum Phenomena in Field-Effect-Controlled Semiconductor Nanostructures”, Proc. IEEE 79, 1106-1116 (1991).

158.     M.L. Schattenburg, C.R. Canizares, D. Dewey, K.A. Flanagan, M.A. Hamnett, A.M. Levine, K.S.K. Lum, R. Manikkalingam, T.H. Markert, and H.I. Smith, “Transmission Grating Spectroscopy and the Advanced X-ray Astrophysics Facility”, Optical Engineering 30, 1590‑1600 (1991).

159.     K. Ismail, F. Legoues, N.H. Karam, J. Carter, and H.I. Smith, “High Quality GaAs on Sawtooth-Patterned Si Substrates”, Appl. Phys. Lett. 59, 2418-2420 (1991).

160.     Y.C. Ku, L.-P. Ng, R. Carpenter, K. Lu, H.I. Smith, L.E. Haas, and I. Plotnik, “In-Situ Stress Monitoring and Deposition of Zero Stress W for X-ray Masks”, J. Vac. Sci. Technol. B 9, 3297‑3300 (1991).

161.     A. Moel, W. Chu, K. Early, Y.C. Ku, E.E. Moon, F. Tsai, H.I. Smith, M.L. Schattenburg, C.D. Fung, F.W. Griffith, and L.E. Haas, “Fabrication and Characterization of High-Flatness Mesa-Etched Silicon Nitride X-ray Masks”, J. Vac. Sci. Technol. B 9, 3287-3291 (1991).

162.     H.I. Smith, S.D. Hector, M.L. Schattenburg, and E.H. Anderson, “A New Approach to High Fidelity E-Beam Lithography Based on an In-Situ, Global Fiducial Grid”, J. Vac. Sci. Technol. B 9, 2992-2995 (1991).

163.     E.H. Anderson, V.Boegli, M.L. Schattenburg, D.P. Kern, and H.I. Smith, “Metrology of Electron Beam Lithography Systems using Holographically Produced Reference Samples”, J. Vac. Sci. Technol. B 9, 3606-3611 (1991).

164.     M.L. Schattenburg, K. Li, R.T. Shin, J.A. Kong, D.B. Olster, and H.I. Smith, “Electromagnetic Calculation of Soft-X-ray Diffraction from 0.1 µm Scale Gold Structures”, J. Vac. Sci. Technol. B 9, 3232-3236 (1991).

165.     A. Kumar and P.F. Bagwell,”Evolution of the Quantized Ballistic Conductance with Increasing Disorder in Narrow-Wire Arrays”, Phys. Rev. B44, 1747-1753 (1991).

166.     C.C. Eugster and J.A. del Alamo, “Tunneling Spectroscopy of an Electron Waveguide”, Phys. Rev. Lett. 67, 3586-3589 (1991).]

167.     [P.L. McEuen, E.B. Foxman, U. Meirav, M.A. Kastner, Y. Meir, N.S. Wingree, and S.J. Wind, “Transport Spectroscopy of a Coulomb Island in the Quantum Hall Regime”, Phys. Rev. Lett. 66, 1926-1929 (1991).]

168.     K.W. Rhee, A.C. Ting, L.M. Shirley, K.W. Foster, J.M. Andrews, M.C. Peckerar, and Y.C. Ku, “Patterning Tungsten Films with an Electron Beam Lithogaphy System at 50 keV for X-ray Mask Applications”, J. Vac. Sci. Technol. B 9, 3292-3296 (1991).

169.     [U. Meirav, P.L. McEuen, M.A. Kastner, E.B. Foxman, A. Kumar, and S.J. Wind, “Conductance Oscillations and Transport Spectroscopy of a Quantum Dot”, Z. Phys. B – Condensed Matter 85, 357-366 (1991).]

170.     W. Chu, H.I. Smith, S.A. Rishton, D.P. Kern, and M.L. Schattenburg,  “Fabrication of 50 nm Line-and-Space X-ray Masks in Thick Au using a 50 keV Electron Beam System”, J. Vac. Sci. Technol. B 10, 118-121 (1992).

171.     A. Yen, H.I. Smith, M.L. Schattenburg, and G.N. Taylor. “An Anti-Reflection Coating for use with PMMA at 193 nm”, J. Electrochem. Soc., 139, 616-619 (1992).

172.     [C.C. Eugster, J.A. del Alamo, M.J. Rooks, M.R. Melloch, “Split-Gate Dual-Electron Waveguide Device”, Appl. Phys. Lett. 5, 642-644 (1992).]

173.     Y. Zhao, D.C. Tsui, M. Santos, M. Shayegan, R.A. Ghanbari, D.A. Antoniadis, and H.I. Smith, “Magneto-optical Absorption in a Two Dimensional Electron Grid”, Appl. Phys. Lett. 12, 1510-1512 (1992).

174.     A. Kumar, “Self-Consistent Calculations on Confined Electrons in Three-Dimensional Geometries”, 9th Conf. on Electronic Properties of 2-D Systems, Nara, Japan, July 8-12, 91, Surface Science, 263, 335-340 (1992).

175.     P.F. Bagwell, S.L. Park, A. Yen, D.A. Antoniadis, H.I. Smith, T.P. Orlando, and M.A. Kastner, “Magnetotransport in Multiple Narrow Silicon Inversion Channels Opened Electrostatically into a Two-Dimensional Electron Gas”, Phys. Rev. B 45, 9214-9221 (1992).

176.     A. Yen, M.L. Schattenburg, and H.I. Smith, “Proposed Method for Fabricating 50 nm-period Gratings by Achromatic Holographic Lithography”, Applied Optics 31, 2972-2973 (1992).

177.     A. Yen, E.H. Anderson, R.A. Ghanbari, M.L. Schattenburg, and H.I. Smith, “Achromatic Holographic Configuration for 100 nm Period Lithography”, Applied Optics 31, 4540-4545 (1992).

178.     [M.A. Kastner, “The Single Electron Transistor”, Rev. Mod. Phys. 64, 849 (1992).]

179.     J.M. Carter, D.B. Olster, M.L. Schattenburg, A. Yen, and H.I. Smith, “Large-Area, Free-Standing Gratings for Atom Interferometry Produced using Holographic Lithography”, J. Vac. Sci. Technol. B 10, 2909-2911 (1992).

180.     Y.C. Ku, M.H. Lim, J.M. Carter, M.K. Mondol, A. Moel, and H.I. Smith, “Correlation of In-Plane and Out-of-Plane Distortion in X-ray Lithography Masks”, J. Vac. Sci. Technol. B 10, 3169-3172 (1992).

181.     S.D. Hector, M.L. Schattenburg, E.H. Anderson, W. Chu, V.V. Wong, and H.I. Smith, “Modeling and Experimental Verification of Illumination and Diffraction Effects on Image Quality in X-ray Lithography”, J. Vac. Sci. Technol. B 10, 3164-3168 (1992).

182.     G.E. Rittenhouse, K. Early, B.S. Meyerson, H.I. Smith, and J.M. Graybeal, “Novel Vertical Silicon-Membrane Structure and Its Application to Josephson Devices”, J. Vac. Sci. Technol. B 10, 2860-2863 (1992).

183.     W. Chu, C.C. Eugster, A. Moel, E.E. Moon, J.A. del Alamo, H.I. Smith, M.L. Schattenburg, K.W. Rhee, M.C. Peckerar, and M.R. Melloch, “Conductance Quantization in a GaAs Electron Waveguide Device Fabricated by X-ray Lithography”, J. Vac. Sci. Technol. B 10, 2966-2969 (1992).

184.     R.A. Ghanbari, W. Chu, E.E. Moon, M. Burkhardt, K. Yee, D.A. Antoniadis, H.I. Smith, M.L. Schattenburg, K.W. Rhee, R. Bass, M.C. Peckerar, and M.R. Melloch, “Fabrication of Parallel Quasi-One-Dimensional Wires using a Novel Conformable X-ray Mask Technology”, J. Vac. Sci. Technol. B 10, 3196-3199 (1992).

185.     R.A. Ghanbari, M. Burkhardt, D.A. Antoniadis, H.I. Smith, M.R. Melloch, K.W. Rhee, and M.C. Peckerar, “Comparative Mobility Degradation in Modulation-Doped GaAs Devices after E-beam and X-ray Irradiation”, J. Vac. Sci. Technol. B 10, 2890-2892 (1992).

186.     K.W. Rhee, D.I. Ma, M.E. Peckerar, R.A. Ghanbari, and H.I. Smith, “Proximity Effect Reduction in X-ray Mask Making using Thin Silicon Dioxide Layers”, J. Vac. Sci. Technol. B 10, 3062-3066 (1992).

187.     H.I. Smith, M.L. Schattenburg, “X-ray Lithography, from 500 to 30 nm:  X-ray Nanolithography”, IBM Journal of Research & Development 37, 319-329 (1993).

188.     Y. Zhao, D.C. Tsui, M. Santos and M. Shayegan, R.A. Ghanbari, D.A. Antoniadis, Henry I. Smith, and K. Kempa, “Mode Softening in the Far Infrared Excitation of Quantum Wire Arrays”, Phys. Rev. B 48, 5249-5255 (1993).

189.     A. Moel, E.E. Moon, R. Frankel, and H.I. Smith, “Novel On-axis Interferometric Alignment Method with Sub-10 nm Precision”, J. Vac. Sci. Technol. B 11, 2191-2194 (1993).

190.     J. Ferrera, V.V. Wong, S. Rishton, V. Boegli, E.H. Anderson, D.P. Kern, and H.I. Smith, “Spatial-Phase-Locked Electron-Beam Lithography:  Initial Test Results”, J. Vac. Sci. Technol. B 11, 2342-2345 (1993).

191.     V.V. Wong, W.-Y. Choi, J. Carter, C.G. Fonstad, and H.I. Smith, “Ridge-Waveguide Sidewall-Grating Distributed Feedback Structures Fabricated by X-ray Lithography”, J. Vac. Sci. Technol. B 11, 2621-2624 (1993).

192.     N. Gupta, S.D. Hector, K.W. Rhee, and H.I. Smith, “Fabrication of 100 nm T-Gates for Monolithic Microwave Integrated Circuits using X-ray Lithography”, J. Vac. Sci. Technol. B 11, 2625-2628 (1993).

193.     M.L. Schattenburg, N.A. Polce, and H.I. Smith, “Fabrication of Flip-Bonded Mesa Masks for X-ray Lithography”, J. Vac. Sci. Technol. B 11, 2906-2909 (1993).

194.     A.W. Yanof, G.L. Zipfel, and E.E. Moon, “X-ray Mask Membrane Motion in Narrow Gap Lithography:  Hydrodynamic Model and Experiment”, J. Vac. Sci. Technol. B 11, 2920-2925 (1993).

195.     S.D. Hector, H.I. Smith, and M.L. Schattenburg, “Simultaneous Optimization of Spectrum, Spatial Coherence, Gap, Feature Bias, and Absorber Thickness in Synchrotron-Based X-ray Lithography”, J. Vac. Sci. Technol. B 11, 2981-2985 (1993).

196.     C.O. Bozler, C.T. Harris, S.Rabe, D.D. Rathman, W.D. Goodhue, M.A. Hollis, and H.I. Smith, “Arrays of Gated Field-Emitter Cones having 0.32 µm Tip-to-Tip Spacings”, J. Vac. Sci. Technol. B 12, 629-632 (1994).

197.     M. Burkhardt, H.I. Smith, D.A. Antoniadis, T.P. Orlando, M.R. Melloch, K.W. Rhee, and M.C. Peckerar, “Fabrication Using X-ray Nanolithography and Measurement of Coulomb Blockade in a Variable-Sized Quantum Dot”, J. Vac. Sci. Technol. B 12, 3611-3613 (1994).

198.     I.Y. Yang, H. Hu, L.T. Su, V.V. Wong, M. Burkhardt, E. Moon, J. Carter, D.A. Antoniadis, H.I. Smith, K.W. Rhee, and W. Chu, “High Performance Self-Aligned Sub-100 nm MOSFETs Using X-ray Lithography”, J. Vac. Sci. Technol. B 12, 4051-4054 (1994).

199.     M. Mondol, H. Li, G. Owen, and H.I. Smith, “Uniform-Stress Tungsten on X-ray Mask Membranes via He-Backside Temperature Homogenization”, J. Vac. Sci. Technol. B 12, 4024-4027 (1994).

200.     S.D. Hector, V.V. Wong, H.I. Smith, M.A. McCord, A. Wagner, and K.W. Rhee, “Printability of sub-150 nm features in X-ray Lithography: theory and experiments”, J. Vac. Sci. Technol. B 12, 3965-3969 (1994).

201.     V.V. Wong, J. Ferrera, J. Damask, J. Carter, E. Moon, H.A. Haus, H.I. Smith, and S. Rishton, “Spatial-Phase Locked E-Beam Lithography and X-ray Lithography for Fabricating First-Order Gratings on Rib Waveguides”, J. Vac. Sci. Technol. B 12, 3741-3745 (1994).

202.     J.Z.Y. Guo, G.K. Celler, J.R. Maldonado, and S.D. Hector, “Wavelength Dependence of Exposure Window and Resist Profile in X-Ray Lithography”, J. Vac. Sci. Technol. B 12, 4044-4050 (1994).

203.     H. Hu, J.B. Jacobs, J.E. Chung, and D.A. Antoniadis, “The Correlation between Gate Current and Substrate current in 0.1 um NMOSFETs”, IEEE Elec. Dev. Lett. 11, 418 (1994).

204.     Y. Zhao, D.C. Tsui, M.B. Santos, M. Shayegan, R.A. Ghanbari, D.A. Antoniadis, and H.I. Smith, “Grating-Induced Cyclotron-Resonance Anomaly in GaAs/Al1Ga1-x As Heterostructures”, Phys. Rev. B51, 13174  (1995).

205.     M. Grayson, D.C. Tsui, M. Shayegan, K. Hirakawa, R.A. Ghanbari, and H. I. Smith, “Far-infrared Emission from Hot Quasi-One-Dimensional Quantum Wires in GaAs”,  Appl. Phys. Lett. 67. 1564  (1995).

206.     T.A. Savas, S.N. Shah, M.L. Schattenburg, J.M. Carter, and H.I. Smith, “Achromatic-Interferometric Lithography for 100nm-Period Gratings and Grids”,  J. Vac. Sci. Technol. B 13(6), 2732-2735 (1995).

207.     I.Y. Yang, S. Silverman, J. Ferrera, K. Jackson, J.M. Carter, D.A. Antoniadis, and H.I.  Smith,, “Combining and Matching Optical, E-beam and X-ray Lithographies in the Fabrication of Si CMOS Circuits with 0.1 and Sub-0.1µm Features”,  J. Vac. Sci. Technol. B 13, 2741-2744 (1995).

208.     R.J. Aucoin and M.L. Schattenburg, “Optically-Matched Tri-Level Resist Process for Nanostructure Fabrication”,  J. Vac. Sci. Technol. B 13, 3007-3011 (1995).

209.     E.E. Moon, P.N. Everett, and H.I. Smith, “Immunity to Signal Degradation by Overlayers Using a Novel Spatial-Phase-Matching Alignment System”, J. Vac. Sci. Technol. B 13, 2648-2652 (1995).

210.     V.V. Wong, J. Ferrera, J.N. Damask, T.E. Murphy, and H.I. Smith, “Distributed Bragg  Grating Integrated Optical Filters; Synthesis and Fabrication”,  J. Vac. Sci. Technol. B 13, 2859-2864 (1995).

211.     V.V. Wong, A. Yasaka, and H.I. Smith, “Resist Planarization over Topography using Ion Implantation”, J. Vac. Sci. Technol. B 13, 2797-2800 (1995).

212.     H.I. Smith, “100 Years of X-rays: Impact on Micro- and Nanofabrication”, J. Vac. Sci. Technol. B 13, 2323-2328 (1995).

213.     M.J. Rooks, R.C. Tiberio, M. Chapman, T. Hammond, E. Smith, A. Lenef, R. Rubenstein, D. Pritchard, S. Adams, J. Ferrera, J.M. Carter, and H.I. Smith, “Coherence and Structural Design of Free-Standing Gratings for Atom-Wave Optics”,  Japan J. Appl. Phys.  34, 6935-6939  (1995).

214.     H.I. Smith, “X-ray Lithography for Microelectronics”, Physics Scripta, 61,  26-31 (1996).

215.     H.I. Smith, M.L. Schattenburg, S.D.  Hector, J. Ferrera, E.E. Moon, I.Y. Yang, and M. Burkhardt, “X-ray Nanolithography: Extension to the Limits of the Lithographic Process”, Microelectronic Engineering 32, 143-158 (1996).

216.     E.E. Moon, P.N. Everett, K. Rhee,  and H.I. Smith, “Simultaneous Measurement of Gap and Superposition in a Precision Aligner for X-ray Nanolithography,” J. Vac. Sci. Technol. B 14,  3969-3973 (1996).

217.     J. Ferrera, M.L. Schattenburg, and H.I. Smith, “Analysis of Distortion in Interferometric Lithography”, J. Vac. Sci. Technol. B 14,  4009-4013 (1996).

218.     I.Y. Yang, D.A. Antoniadis, and H.I. Smith, “Fabrication of Back-gated CMOS Devices Using Mixed and Matched Optical and X-ray Lithographies,” J. Vac. Sci. Technol.  B 14, 4024-4028 (1996).

219.     T.A. Savas, M.L. Schattenburg, J.M. Carter, and H.I. Smith, “Large-Area Achromatic Interferometric Lithography for 100nm-Period Gratings and Grids; With Novel Applications,” J. Vac. Sci. Technol. B 14,  4167-4170 (1996).

220.     H.I. Smith, “A Proposal for Maskless,  Zone-Plate-Array Nanolithography,” J. Vac. Sci. Technol. B 14, 4318-4322 (1996).

221.     J. Damask, “Practical Design of Side-Coupled Quarter-Wave Shifted Distributed-Bragg Resonant Filters,” J. Lightwave Tech. 14(5), 812-821 (1996).

222.     H.I. Smith and F. Cerrina, “X-ray Lithography for ULSI manufacturing?” Microlithography World 6(1),  10-15 (1997).

223.     J.S. Foresi, P.R. Villeneuve, J. Ferrera, E.R. Thoen, G. Steinmeyer, S. Fan, J.D. Joannopoulos, L.C. Kimerling, H.I. Smith, E.P. Ippen, “Photonic-Band-Gap Waveguide Microcavities,” Nature, 390,  143-145, (1997).

224.     J. Goodberlet, J. Ferrera, and H.I. Smith, “An Analogue Delay-Locked Loop for Spatial-Phase Locking”, Electronics Letters, 33 (15) 1269-1270 (1997).

225.     E.M. Koontz, M.H. Lim, V.V. Wong, G.S. Petrich, L.A. Kolodziejski, H.I. Smith, K.M. Matney, G.D. U’Ren, and M.S. Goorsky, “Preservation of Rectangular-Patterned InP Gratings Overgrown by Gas Source Molecular Beam Epitaxy,” Appl. Phys. Lett. 71 (10), 1400-1402  (1997)

226.     B.E. Little & T.Murphy, “Design Rules for Maximally Flat Wavelength-Insensitive Optical Power Dividers Using Mach-Zehnder Structures”, IEEE Photonics Technology Letters, 9 (12),  1607-1609 (1997).

227.     J. Goodberlet, J. Ferrera, and H.I. Smith, “Spatial-phase-locked electron-beam lithography with a delay-locked loop,” J. Vac. Sci. Technol. B,  15(6), 2293-2297 (1997).

228.     D.J.D. Carter, A. Pepin, M.R. Schweizer, and H.I. Smith, “Direct Measurement of the effect of substrate photoelectrons in x-ray nanolithography,” J. Vac. Sci. Technol. B, 15(6), 2509-2513 (1997).

229.     D. Berman, N. Zhitenev, R.C. Ashoori, and H.I. Smith, “The Single Electron Transitor as a Charge Sensor in Semiconductor Applications,” J. Vac. Sci. Technol. B, 15(6), 2844-2847 (1997).

230.     A.E. Franke,  M.L. Schattenburg, E.M. Gillikson, J. Cottam, S.M. Kahn and A. Rasmussen, “Super-Smooth X-Ray Reflection Grating Fabrication,” J. Vac. Sci. Technol. B, 15(6), 2940-2945 (1997).

231.     M. Farhoud, M.M. Hwang, H.I. Smith, J.M. Bae, K. Youcef-Toumi and C.A. Ross, “Fabrication of Large Area Nanostructured Magnets by Interferometric Lithography.”  IEEE Trans. Magn. 34, 1087-1089 (1998). (MMM/Intermag Conference 1/98)

232.     J. Goodberlet, J. Ferrera, M. Farhoud, V.Z. Chan, and H.I. Smith, “Extending Spatial-Phase-Locked Electron-Beam Lithography to Two Dimensions,” Japanese Journal of Applied Physics 36, 7557-7559 (1997), Part 1, No 12B (1997).

233.     G.D. U’Ren, M.S. Goorsky, E.M. Koontz, M.H. Lim, G.S. Petrich, L.A. Kolodziejski, V. V. Wong, Henry I. Smith, K.M. Matney and. M Wormington, “Analysis of Lattice Distortions in High Quality InGaAsP Epitaxial Overgrowth of Rectangular-Patterned InP Gratings”, J. Vac. Sci. Technol. B 16(3), (1998).

234.     C.A.  Ross and H. I. Smith, “Patterned Media:  200 Gb/in2 or bust”, Data Storage, 5 (10), 41-48, (1998). (invited)

235.     W. Schollkopf, J.P. Toennies, T.A. Savas and H.I. Smith, “A Cluster Size Nanofilter with Variable Openings between 2 and 50nm”, Journal of Chemical Physics, 109 (21), 9252-9257, (1998).

236.     I. Djomehri, T. Savas, and H.I. Smith, “Zone-Plate-Array Lithography in the Deep Ultraviolet”,  J. Vac Sci. Technol. B, 16(6), 3426-3429, (1998).

237.     E. Moon, J. Lee, P. Everett and H.I. Smith, “Application of Interferometric Broadband Imaging Alignment on an Experimental X-ray Stepper”, J. Vac Sci. Technol. B 16(6), 3631-3636, (1998).

238.     J. Goodberlet, J. Carter and H.I. Smith, “A Scintillating Global-Fiducial Grid for Electron-Beam Lithography”,  J. Vac. Sci. Technol. B 16(6), 3672-3675, (1998).

239.     J.T.M. Van Beek, R.C. Fleming, P.S. Hindle, J.D. Prentiss and M.L. Schattenburg, “Nano-scale freestanding gratings for UV blocking filters”, J. Vac. Sci. Technol. B 16(6), 3911-3916, (1998).

240.     D.J. Twisselmann, M. Farhoud, H.I. Smith and C.A. Ross, “In-Plane Magnetic Anisotropy in CoCrPt and CoCrTa Films Deposited Onto Patterned Silicon Substrates”, J. Appl. Physics, 85, 4292-4294  (1999).

241.     T.A. Savas, M. Farhoud, H. I. Smith, M. Hwang, and C.A. Ross, “Properties of large-area nanomagnet arrays with 100 nm period made by interferometric lithography” J. Appl. Physics, 85, 6160-6162  (1999).

242.     K-Y Lim, D.J. Ripin, G.S. Petrich, L.A. Kolodziejski, E.P. Ippen, M. Mondol, H.I. Smith, P.R. Villeneuve, S. Fan, J.D. Joannopoulos, “Photonic bandgap waveguide microcavities:  monorails and air-bridges”, J. Vac. Sci. Technol. B 17(3), 1171–1174(1999)

243.     E.M. Koontz,  G.D. U’Ren, M.H. Lim, L.A. Kolodziejski, M.S. Goorsky, G.S. Petrich, and Henry I. Smith, “Overgrowth of (In,Ga)(As,P) on Rectangular-Patterned Surfaces Using Gas Source Molecular Beam Epitaxy”, J. Crystal Growth 198/199, 1104—1110 (1999).

244.     J.O. Choi, H.S. Jeong, D.G. Pflug, A.I. Akinwande and H.I. Smith, “Fabrication of 0.1 mm gate aperture Mo-tip field-emitter arrays using interferometric lithography” Appl. Phy. Lett., 74 (20),  3050-3052 (1999).

245.     M.L. Schattenburg, C. Chen, P.N. Everett, J. Ferrera, P. Konkola, and Henry I. Smith,  “Sub-100 nm metrology using interferometrically produced fiducials (invited), J. Vac. Sci. Technol. B 17(6), 2692-2697 (1999).

246.     E.E. Moon, P. N. Everett, M. Meinhold, M. Mondol and Henry I. Smith, “A Novel Mask-Wafer Gap-Measurement Scheme with Nanometer-Level Detectivity”, J. Vac. Sci. Technol. B, 17(6), 2698-2702 (1999).

247.     M.H. Lim, T.E. Murphy, J. Ferrera, J.N. Damask and Henry I. Smith, “Fabrication Techniques for Grating-Based Optical Devices”, J. Vac. Sci. Technol. B, 17(6), 3208-3211 (1999).

248.     M.H. Lim, J. Ferrera, K.P. Pipe and Henry I. Smith, “A Holographic Phase-Shifting Interferometer Technique to Measure In-Plane Distortion”, J. Vac. Sci. Technol. B 17(6), 2703-2706 (1999).

249.     D.J.D. Carter, D. Gil, R. Menon, M. Mondol and Henry I. Smith, “Maskless, Parallel Patterning with Zone-Plate Array Lithography (ZPAL),   J. Vac. Sci. Technol. B 17(6) 3449-3452 (1999).

250.     M. Farhoud, J. Ferrera, A.J. Lochtefeld, M.L. Schattenburg, C.A. Ross and Henry I. Smith, “Fabrication of 200 nm period nanomagnet arrays using interferometric lithography and a negative resist”, J. Vac. Sci. Technol. B, 17(6), 3182-3185 (1999).

251.     C. A. Ross, H.I. Smith, T. Savas, M. Schattenburg, M. Farhoud, M. Hwang, M. Walsh, M. Abraham, R. Ram, “Fabrication of Patterned Media for High Density Magnetic Storage (invited)”, J. Vac. Sci. Technol. B, 17(6) 3168-3176 (1999).

252.     R.E. Grisenti, W. Schollkopf, J.P. Toennies, G.C. Hegerfeldt and T. Kohler, “Determination of Atom-Surface van der Waals Potentials from Transmission-Grating Diffraction Intensities”, Phys,. Rev. Let.,  83(9), 1755-1758 (1999).

253.     C.A. Ross, T.A. Savas, H.I. Smith, M. Hwang and R. Chantrell, “Modelling of Hysteresis Loops of Arrays of 100 nm Period Nanomagnets”, IEEE. Trans. Magnetics, 35, 3781    (1999).

254.     R.E. Grisenti, W. Schoellkopf, J.P. Toennies, J.R. Manson, T.A. Savas and H.I. Smith, “He Atom Diffraction from Nanostructured Transmission Gratings:  The Role of Imperfections”, Phys. Rev. A. 61,  033608-1-033608-15 (2000).

255.     James G. Goodberlet, “Patterning 100 nm features using  deep-ultraviolet contact photolithography”, Appl. Phy. Lett. 76(6) 667-669,  (2000).

256.     M. Farhoud, H.I. Smith, M. Hwang and C.A. Ross, “The effect of aspect ratio on the magnetic anisotropy of particle arrays”,  J. Appl. Phys., 87(9) 5120-5122 (2000).

257.     R.E. Grisenti, W. Schollkopf, J.P. Toennis, G.C. Hegerfeldt, T. Kohler and M. Stoll, “Determination of the Bond Length and Binding Energy of the Helium Dimer by Diffraction from a Transmission Grating”, Phys. Rev. Let., 85(11), 2284—2287 (2000).

258.     C.R. Canizares, D.P. Huenemoerder, D.S. Davis, D. Dewey, K.A. Flanagan, J. Houck, T.H. Markert, H.L. Marshall, M.L. Schattenburg, N.S. Schulz, M. Wise, J.J. Drake and N.S. Brickhouse, “High Resolution X-Ray Spectra of Capella:  Initial Results from the Chandra High Energy Transmission  Grating Spectrometer”, Astrophysical Journal Letters 539, L41-L44 (2000); also, proeedings from the Atomic Data Needs for X-ray Astronomy Meeting, NASA Publications, Vol. 1, Bautista, Kallman and Pradhan, eds. (2000).

259.     Paul T. Konkola, Carl G. Chen, Ralf K. Heilmann and Mark L. Schattenburg, “Beam Steering System and Spatial Filtering Applied to Interference Lithography”, J. Vac. Sci. Technol. B 18(6), 3282-3286, (2000).

260.     Dario Gil, Rajesh Menon, D. J. D. Carter and Henry I. Smith, “Lithographic Patterning and Confocal Imaging with Zone Plates, ”J. Vac. Sci. Technol. B 18(6), 2881-2885, (2000).

261.     Ken-Ichi Murooka, Michael H. Lim, and Henry I. Smith, “Membrane-mask distortion correction:  Analytical and experimental results”, J. Vac. Sci. Technol. B 18(6), 2966- 2969, (2000).

262.     J. T. Hastings, Feng Zhang, James Goodberlet, and Henry I. Smith, “Two-Dimensional Spatial-Phase-Locked  Electron-Beam Lithography  via sparse Sampling, ”, J. Vac. Sci. Technol. B 18(6), 3268-3271, (2000).

263.     Thomas E. Murphy, Mark K. Mondol and Henry I. Smith, “Characterization of field stitching in e-beam lithography using moiré metrology”, J. Vac. Sci. Technol. B 18(6), 3287-3291, (2000).

264.     Ralf K. Heilmann, Paul T. Konkola, Carl G. Chen and Mark L. Schattenburg, “Relativistic corrections in displacement measuring interferometry”, J. Vac. Sci. Technol. B 18(6), 3277-3281, (2000).

265.     Michael E. Walsh, Yaowu Hao, Caroline A. Ross and Henry I. Smith, “Optimization of a lithographic and ion beam etching process for nanostructuring  magnetic resistive thin film stacks”, J. Vac. Sci. Technol. B 18(6), 3539-3543, (2000).

266.     C.A. Ross, R. Chantrell, M. Hwang, M. Farhoud, T.A. Savas, Y. Hao, Henry I. Smith, F.M. Ross, M. Redjdal, F. Humphrey, “Incoherent magnetization reversal observed in 30 nm Ni particles”, Phys. Rev. B. 62(21), 14 252- 14 258, (2000).

267.     Carl G. Chen, Ralf K. Heilmann, Paul T. Konkola, Oliver Mongrard, Glen P. Monnelly, and Mark L. Schattenburg,  “Microcomb Design and Fabrication for High Accuracy Optical Assembly”, J. Vac. Sci. Technol. B 18(6),  3272-3276, (2000).

268.     C.A. Ross, M. Farhoud, M. Hwang, Henry I. Smith, M. Redjdal, F.B. Humphrey, “Micromagnetic behavior of conical ferromagnetic particles”, J. Appl. Phys, 89, 1310-1319, (2000).

269.     M. Hwang, M.C. Abraham, T.A. Savas, H.I. Smith, R.J. Ram and C.A. Ross, “Magnetic force microscopy study of interactions in 100 nm period nanomagnet arrays”, J. Appl. Phys. 87 5108-10 (2000).

270.     J-Q Wang, L. M. Malkinski, Y. Hao, C. A. Ross, J. A. Wiemann, C. J. O’Connor, “Fabrication of pseudo-spin-valves and 100  nm sized periodic elements for magnetic memory application”, Materials Science and Enginering B76, 1-5 (2000).

271.     Douglas J. Twisselmann, Yuh-Jer Shine, and C. A. Ross, “Correlation of Stress and Magnetic Anisotropy in CoCrPt/Cr Films Grown on Textured Substrates”, IEEE Trans. Mag. 36(5), (2000).

272.     C-C. Hsu, R. S. Indeck, A. Jander, M. W. Muller, C. A. Ross and D. J. Twisselmann, “MFM observation of magnetization reversal rocess in recording media with lithographically defined texture”, IEEE Trans. Magn. 36, 2327-2329, (2000).

273.     C. A. Ross, S. Haratani, F. J. Castano, B. Vogeli, S. Sumita, “Fabrication of MRAM structure and their magnetic properties”, J. f the Society of Materials Engineering for Resources of Japan 14, 43-51, (2001).

274.     H. I. Smith, “Japan could dominate industry with X-ray lithography”, Semiconductor International, Vol. 24, No. 2, pp. 67–72 (2001)

275.     S. S. Yi, P. D. Moran, X.  Zhang, F. Cerrina, J. Carter, H.I. Smith, T.F. Kuech, “Oriented crystallization of GaSb on a patterned, amorphous Si substrate”, App. Phys. Lett.  78(10), 1358-1360 (2001).

276.     M.C. Abraham, H. Schmidt, T.A. Savas, Henry I. Smith, C.A. Ross, R.J. Ram, “Magnetic Properties and Interactions of Single Domain nanomagnets in a periodic array”, J. Appl. Phys.  89(10),  5667-5670, (2001).

277.     T. E. Murphy, J. T. Hastings and Henry I. Smith, “Fabrication and Characterization of Narrow-Band Bragg-Reflection Filters in Silicon-on-Insulator Ridge Waveguides”, Journal of Lightwave Technology, 19(12) 1938-1942,  (2001).

278.     J. T. Hastings, J. G. Goodberlet and Henry I. Smith, “Performance of the Raith-150 Electron-Beam lithography System”, J. Vac. Sci. Technol. B 19(6), 2499-2503 (2001).

279.     Michael E. Walsh, Henry I. Smith, “Method for Reducing Hyperbolic Phase In Interference Lithography”, J. Vac. Sci. Technol. B 19(6), 2347-2352 (2001).

280.     B. Vogeli and Henry I. Smith, “Patterning processes for fabricating sub-100 nm pseudo-spin valve structures”, J. Vac. Sci. Technol. B 19(6), 2753-2756 (2001).

281.     J.O. Choi, A.I. Akinwande and H. I. Smith, “100 nm gate hole openings for low voltage driving field emission display applications”, J. Vac. Sci. Technol. B 19(3), 900-903 (2001).

282.     Ken-ichi Murooka, Michael H. Lim and Henry I. Smith, “Calculational study on  membrane mask distortion and correction”, J. Vac. Sci. Technol. B 19(4), 1229-1234 (2001).

283.     F. J. Castano, B. Vogeli, Y. Hao, S. Haratani, M. Hwang, H. I. Smith, and C. A. Ross, “Magnetization Reversal in Sub-100 nm Pseudo-Spin-Valve Element Arrays”, Appl. Phys. Lett. 79(10), 1504-1506  (2001).

284.     F. J. Castano, Y. Hao, S. Haratani, C. A. Ross, B. Vogeli, M. Walsh, Henry I. Smith, “Magnetic Switching in 100 nm Patterned Pseudo Spin Valves” IEEE Trans. Mag.37(4), 2073-2075 (2001).

285.     H. I. Smith, “Low cost nanolithography with nanoaccuracy”, Physica E, Vol. 11, 104-109 (2001).

286.     A. A. Erchak, D. J. Ripin, S. Fan, P. Rakich, J.D. Joannopoulos, E. Ippen, G.S. Petrich and L. Kolodziejski, “Enhanced coupling to vertical radiation using a two-dimensional photonic crystal in a semiconductor light-emitting diode”, Appl. Phys. Let., 78(5), 563-565 (2001).

287.     Mark L. Schattenburg, “From nanometers to gigaparsecs:  The role of nanostructures in unraveling the mysteries of the cosmos”, J. Vac. Sci. Technol. B 19(6), 2319-2328, (2001).

288.     J. Y. Cheng, C. A. ross, V. Z. H. Chan, E. L. Thomas, R. G. H. Lampertink and G. J. Vancso, “Fabrication of nanopatterned thin films using self-assembled block copolymer lithography”, Adv. Mater. 13, 1174-1178 (2001).

289.     S. L. Whittenburg, N. Dao, C. A. Ross, “Micromagnetic studies of hysteresis in nickel pillars”, Physica B 306, 44-46 (2001).

290.     C. A. Ross, M. Hwang, M. Shima, J. Y. Cheng, M. Farhoud, T. A. Savas, Henry I. Smith, W. Schwarzacher, F. M. Ross, M. Redjdal and F. B. Humphrey, “Micromagnetic behavior of electrodeposited cylinder arrays”, Physical Review B 65, 144417-1-144417-8 , (2002).

291.     K-I. Murooka, M.H. Lim, Henry I. Smith, “Membrane Mask Magnification Correction:  An Alternate Technique”, J. Vac. Sci. Technol. B 20(1), 370-372 , (2002).

292.     K-I. Murooka, M.H. Lim, Henry I. Smith, “Effect of thermal diffusion on a membrane-mask-distortion correction and compensation method”, J. Vac. Sci. Technol. B 20(2), 721-724 (2002).

293.     Masaki Yoshizawa and T. A. Savas, “A Feasibility Study of 50 nm Resolution with Low Energy Electron Beam Proximity Projection Lithography”, Jpn. J. Appl. Phys. 41, 87-88, (2002).

294.     M.  Peuker, M.H. Lim, Henry I. Smith, R. Morton, A.K. van Langen-Suurling, J. Romijn, E.W.J.M. van der Drife, F.C.M.J.M. van Delft,  “Hydrogen Silses Quioxane, a High Resolution Negative Tone e-beam Resis, Investigated for its Applicability in Photon Based Lithographies”, Microelectronic Engineering, 61-62, 803-809, (2002).

295.     C. A. Ross, S. Haratani, F. J. Castano, Y. Hao, B. Vogeli, M. Farhoud, M. Walsh and Henry I. Smith, “Magnetic behavior of lithographically patterned particle arrays (invited), J. Appl. Phys. 91(10), 6848-6853,  (2002).

296.     Hans-Jurgen Eisler, Vikram C. Sundar, Moungi G. Bawendi, Michael Walsh, Henry I. Smith, Victor Klimov, “Color-Selective Semiconductor Nanocrystal Laser”, Appl. Phy. Lett., 80(24) 4614-4616,  (2002).

297.     F. J. Castano, S. Haratani, Y. Hao, C. A. Ross, Henry I. Smith, “Giant magnetoresistance in 60-150-nm-wide pseudo-spin-valve nanowires”, Appl. Phys. Lett. 81(15), 2809-2811,  (2002).

298.     Y. Hao, F. J. Castano, C. A. Ross, b. Vogeli, M. E. Walsh, Henry I. Smith, “Magnetization reversal in lithographically patterned sub-200-nm Co particle arrays”, J. Appl. Phys. 91(10), 7989-7991,  (2002).

299.     F. J. Castano, Y. Hao, C. A. Ross, B. Vogeli S. Haratani, and Henry I. Smith, “Switching field trends in pseudo spin valve nanoelement arrays”, J. Appl. Phys. 91(10), 7317-7319, (2002).

300.     James G. Goodberlet and Hamide Kavak, “Patterning Sub-50 nm features with near-field embedded-amplitude masks”, Appl. Phys. Lett. 81(7), 1315-1317,  (2002).

301.     C. A. Ross, M. Hwang, M. Shima, Henry I. Smith, M. Farhoud, T. A. Savas, W. Schwarzacher, J. Parrochon, W. Esoffier, H. Neal Bertram, F. B. Humphrey and M. Redjdal, “Magnetic properties of arrays of electrodeposited nanowires”, Journal of Magnetism and Magnetic Materials 249, 200-207,  (2002).

302.     J.Y. Cheng, C.A. Ross, E.L. Thomas, H.I. Smith, R.G.H. Lammertink and G.J. Vancso, “Magnetic Properties of Large-Area Particle Arrays Fabricated using Block Copolymer Lithography”, IEEE Transactions of Magnetics, Vol. 38(5) 2541-2543,  (2002).

303.     M. Qi and Henry I. Smith, “Achieving nanometer-scale, controllable pattern shifts in x-ray lithography using an assembly-tilting technique”, J. Vac. Sci. Technol. B 20(6), 2991 – 2994, (2002).

304.     J.T. Hastings, M.H. Lim, J.G. Goodberlet and Henry Smith, “Optical Waveguides with Apodized Sidewall Gratings via spatial-phase-locked electron-beam lithography”, J. Vac. Sci. Technol. B 20(6), 2753-2757,  (2002).

305.     Chulmin Joo, G.S. Pati, P. K. Konkola, C. G. Chen, R. Heilmann, E.H. Anderson, Mark Schattenburg, “Precision fringe metrology using a Fresnel zone plate”, J. Vac. Sci. Technol. B 20(6), 3075-3079,  (2002).

306.     C. G. Chen, R. K. Heilmann, C. Joo, P. T. Konkola, G.S. Pati and  Mark L. Schattenburg, “Beam alignment for scanning beam interference lithography”, J. Vac. Sci. Technol. B 20(6), 3071-3074,  (2002).

307.     G. S. Pati, P.T. Konkola, C. G. Chen, C. Joo, R. K. Heilmann and M. L. Scattenburg, “Generalized scanning beam interference lithography system for patterning gratings with variable period progressions”, J. Vac. Sci. Technol. B 20(6), 2617-2621,  (2002).

308.     Dario Gil, D.J.D. Carter, R. Menon, X. Tang and Henry I. Smith, “Parallel maskless optical lithography for prototyping, low-volume production, and research”, J. Vac. Sci. Technol. B 20(6), 2597-2601,  (2002).

309.     M. Yoshizawa, “Sub-50 nm Stencil Mask for Low-Energy Electron-Beam Projection Lithography, J. Vac. Sci. Technol. B 20(6), 3021-3024,  (2002).

310.     R.A. Forber, Z.W. Chen, S. Mrowka, C.G. Gaeta, K. Cassidy, H.I. Smith and I.C.E. Turcu, JMAR Research Inc., San Diego, CA, X-Ray Optical Systems, Albany, NY, and MIT, Cambridge, MA,  “Collimated Point-Source X-ray Nanolithography”, J. Vac. Sci. Technol. B 20(6), 2984-2990,  (2002).

311.     Saul Griffith, Mark Mondol, David S. Kong, Joseph M. Jacobson, “Nanostructure Fabrication by Direct Electron-Beam Writing of Nanoparticles”, J. Vac. Sci. Technol. B 20(6), 2768-2772,  (2002).

312.     C. J. Gaeta, H. Rieger, I.E.E. Turcu, R.A. Forber, S.M. Campeau, K.L. Cassdy, M.F. Powers, J.R. Maldonado, G. French, J. Naungayan, C. Kelsy, P. Hark, J.H. Morris, R.M. Foster, H.I. Smith, M.H. Lim, “High Power Compact Laser-Plasma Source for X-Ray Lithography”, Jpn. J. Appl. Phys.  Vol. 41, 4111-4121, (2002).

313.     J.Y. Cheng, C.A. Ross, E.L. Thomas, H.I. Smith, G.J. Vancso “Fabrication of nanostructures with long-range order using block copolymer lithography”, Appl. Phys. Letts., 81(19),  3657-3659,  (2002).

314.     N. Dao, S. L. Whittenburg, Y. Hao, C. A. Ross, L. M. Malkinski, J. Q. Wang, “Magnetization reversal of elliptical Co/Cu/Co pseudo-spin valve dots”, J. Appl. Phys. 91(10) 8293-8295, (2002).

315.     Xiabin Zhu, P. Grutter, Y. Hao, F. J. Castano, S. Haratani, C.A. Ross, B. Vogeli and H.I. Smith, “Magnetization switching in 70 nm-wide pseudo-spin-valve nanoelements”, J. Appl. Phys. 93(2), 1132-1136. (2003).

316.     John G. Hartley, Timothy R. Groves, Henry I. Smith, Mark K. Mondol, James G. Goodberlet, Mark L. Schattenburg, Juan Ferrera and Alexandr Bernshteyn, “Spatial-phase locking with shaped-beam lithography”, Review of Scientific Instruments, Vol. 74(3), 1377-1379,  (2003).

317.     F. J. Castano, C.A. Ross, C. Frandsen, A. Eilez, D. Gil, Henry I. Smith, M. Redjdal and F.B. Humphrey, “Metastable states in magnetic nanorings”,  Physical Review B, 67, 184425, (2003).

318.     Y. Hao, C.  A. Ross, Henry I. Smith, “Thermal stability of lithographicaly patterned sub-200 nm NiFe elements”, J. Appl. Phys. 93(10), 7909-7911 (2003).

319.     F.J. Castano, Y. Hao, S. Haratani, C. A. Ross, B. Vogeli, Henry I. Smith, C. Sanchez-Hanke, C.C. Kao, X. Zhu, P. Grutter, “Magnetic force microscopy and x-ray scattering study of 70 x 550 nm2 pseudo-spin-valve nanomagnets”, J. Appl. Pys. 93(10), 7927-7929,  (2003)

320.     X. Zhu, P. Grutter, V. Metlushko, Y. Hao, F. J. Castano, C. A. Ross, B. Ilic, H. I. Smith, “Construction of hysteresis loops of single domain elements and coupled permalloy ring arrays by magnetic force microscopy”, J. Appl. Phys. 93(10), 8540-8542,  (2003).

321.     J. Y. Cheng, C.A. Ross, E.L. Thomas, Henry I. Smith, G.J. Vancso, “Templated Self-Assembly of Block Copolymers:  Effect of Substrate Topography”, Adv. Mater. 2003, 15 No. 19, October 2. 1599-1602. (2003).

322.     Euclid E. Moon, Lynn Chen, Patrick N. Everett and Henry I. Smith, “Interferometric-Spatial-Phase Imaging for 6-Axis Mask control”, J. Vac. Sci. Technol. B 21(6), 3112-3115  (2003).

323     Dario Gil, Rajesh Menon and Henry I. Smith, “The Case for Diffractive Optics in Maskless Lithography”, J. Vac. Sci. Technol. B 21(6), 2810-2814  (2003).

324     Dario Gil, Rajesh Menon and Henry I. Smith, “Fabrication of High-Numerical-Aperture Phase Zone Plates with a Single Lithography Exposure and no Etching”, J. Vac. Sci. Technol. B 21(6), 2956-2960  (2003).

325     X. Zhuang, D. Conkerton, A. Lal, M. Feldman, T. O’Reilly and H.I. Smith, “Adaptive Membrane Masks”, J. Vac. Sci. Technol. B 21(6), 3082-3085 (2003).

326     Tymon Barwicz, Henry I. Smith, “Evolution of line-edge roughness during fabrication of high-index-contrast microphotonic devices”, J. Vac. Sci. Technol. B 21(6), 2892-2896  (2003).

327     J. T. Hastings, Feng Zhang, and Henry I. Smith, “Nanometer-Level Stitching in raster-Scanning E-Beam Lithography Using Spatial-Phase Locking”, J. Vac. Sci. Technol. B 21(6), 2650-2656  (2003).

328     T. Barwicz, M.A. Popovic, P.T. Rakich, M.R. Watts, H.A. Haus, E.P. Ippen, and H.I. Smith “Microring-resonator-based add-drop filters in SiN: fabrication and analysis,” Optics Express, vol. 12, pp. 1437-1442, 2004.

329     A F.J. Castano, C.A. Ross, A. Eilez, D. Gil and Henry I. Smith, “Magnetization reversal in lithographically defined elliptical-ring nanomagnets”, Journal of Physics D: Applied Physics, 36, 2031-2035 (2003).

330     F. J. Castaño, C. A. Ross, A. Eilez, W. Jung, and C. Frandsen, “Magnetic configurations in 160-520 nm diameter ferromagnetic rings”, Physical Review B, 69, 144421 (2004).

331     Minghao Qi, Elefterios Lidorikis, Peter T. Rakich, Steven G. Johnson, J.D. Joannopoulos, Erich P. Ippen and Henry I. Smith, “A three-dimensional optical photonic crystal with designed point defects” Nature Magazine, Vol. 429, 538-542, June 2004.

332     F.M. Ross, M. Kammler, M.E. Walsh, M.C. Reuter, “In situ reflection electron microscopy of Ge island formation on mesa structures”, Microscopy and Microanalysis 10, p. 104 (2004)

333     Henry I. Smith, R. Fabian Pease, “Reaching for the bottom:  The evolution of EIPBN”, J. Vac. Sci. Technol. B 22(6), p.1-2, Nov/Dec 2004.

334     Ken-ici Murooka, Michael H. Lim and Henry I. Smith, “System optimization of membrane mask distortion correction based on fourier analysis”, J. Vac. Sci. Technol. B 22(5) Sep/Oct, 2309-2313. (2004)

335     R. Menon, A. Patel, E. E. Moon, and Henry I. Smith, “Alpha-prototype system for zone-plate-array lithography”, J. Vac. Sci. Technol. B 22(6), pp. 3032-3037, Nov/Dec 2004.

336     W. Jung, F. J. Castano, C. A. Ross, R. Menon, A. Patel, E. E. Moon and Henry I. Smith, “Elliptical-ring magnetic arrays fabricated using zone-plate-array lithography”, J. Vac. Sci. Technol. B 22(6), p. 3335-3338, Nov/Dec. 2004

337   Christel Zanke, Minghao Qi and Henry I. Smith, “Large-area Patterning for 2D and 3D Photonic Crystals via Coherent Diffraction Lithography (CDL)”, J. Vac. Soi. Technol. B 22(6), pp. 3352-3355 Nov/Dec. 2004

338   S. Assefa, G. S. Petrich, L. A. Kolodziejski, M. K. Mondol, and Henry I. Smith, “Fabrication of photonic crystal waveguides composed of a square lattice of dielectric rods”, J. Vac. Sci. Technol. B 22(6), pp. 3363-3365, Nov/Dec. 2004.

339   E. E. Moon, L. Chen, P. Everett, M. Mondol, Henry I. Smith, “Nanometer gap measurement and verification via the chirped-Talbot effect, J. vac. Sci. Technol. B 22(6), pp. 3378-3381, Nov/Dec 2004.

340   R. Menon, E. E. Moon, M. K. Mondol, F. J. Castano, Henry I. Smith, “Scanning-spatial-phase alignment for zone-plate-array lithography”, J. Vac. Sci. Technol. B 22(6), pp. 3382-3385, Nov/Dec 2004.

341   Feng Zhang and Henry I. Smith, “Partial Blanking of an Electron Beam Using a quadrupole Lens”, J. Vac. Sci. Technol. B 22(6), pp. 133-137, Nov/Dec 2004.

342   Solomon Assefa, Peter T. Rakich, Peter Bienstman, Steven G. Johnson, Gale S. Petrich, John D. Joannopoulos, Leslie A. Kolodziejski, Erich P. Ippen, and Henry I. Smith, “Guiding 1.5 mm Light in Photonic Crystals Based on dielectric Rods”, Applied Physics Letters, Vol. 85(25), pp. 6110-6112  (2004).

343   Tymon Barwicz, Miloš A. Popović, Peter T. Rakich, Michael R. Watts, Hermann A. Haus, Erich P. Ippen, and Henry I. Smith,”Microring-resonator-based add-drop filters in SiN: fabrication and analysis,” Optics Express Vol. 12, No. 7, p.1437, 2004.

344   Rajesh Menon, Dario Gil, George Barbastathis, Henry I. Smith, “Photon-sieve lithography”, J. Opt. Soc. Am. A Vol. 22, No. 2/p. 342-345, February 2005.

 

 

AWAITING PUBLICATION:

  A     Minghao Qi, J. D. Joannooulos and Henry I. Smith, “A Three-Dimensional Optical Photonic Crystal with Designed Point-Defects”, submitted to the 48th International Conference on Electron Ion and Photon Beam Technology and Nanofabrication, June 1-4, 2004  – San Diego, CA.

   B     Amy Yu, Tim Savas, Scott Taylor, Anthony guiseppe-Elie, Henry I. Smith, Francesco Stellacci, “Supramolecular Nano Contact-Printing: using DNA as a moveable type”, Submitted to Nature.

   C     C. A. Ross, F. J. Castano, E. Rodriguez, S. Haratani, B. Vogeli and Henry I. Smith, “Size-dependent switching of multilayer magnetic elements”, Journal of Aplied Physics, 97, 1 (2005).

  D     J. W. Taylor, Q. Leonard, D. Malueg, J. Wallace, F. Cerrina, E. Moon and Henry I. Smith, “Development, Installation and Performance of the x-ray stepper”, To be submitted to the EIPBN 05 Conference.

   E     R. Menon, “Experimental Characterization of Focusing by High-Numerical-Aperture Zone Plates”, Submitted to J. Opt. Soc. Amer. (6/05).

   F     R. Menon, D. Gil, Henry I. Smith, “Exerimental Characterization of focusing by High-Numerical-Aperture Zone Plates”, submitted to J. Opt. Soc. Amer. (2005)

   G     W. Arora, A. J. Nichol, Henry I. Smith, George Barbastathis, “Membrane Folding to Achieve 3-D Nanostructures:  Nano-Patterned Sillicon Nitride Folded with Stressed Chromium Hinges”, submitted to APS/123-QED (2005).