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Miscellaneous Presentations

 1     H.I. Smith, “Ion Beam Etching”, 3rd Annual Symposium on Advances in Sputtering, Etching and Related Vac. Technol., Burlington, May 9 – June 1; May 17, 1976, 10 pp., 33 references.

  2     H.I. Smith, “New Applications of Submicrometer Structures”, Stanford University Colloquium, April 1978; California Institute of Technology, Pasadena, CA, April 1978.  (Invited)

  3     H.I. Smith, “E-Beam and X-ray Lithography”, SPIE 31st Annual Conference,  Washington, DC, May 1978.  (Invited)

  4     M.W. Geis, D.C. Flanders, and H.I. Smith, “Orientation of Silicon on an Amorphous Substrate using Artificial Surface Relief Gratings and Laser Crystallization”, Gordon Research Conference, January 1979.  (Invited)

  5     H.I. Smith, “Fabrication and Applications of Artificial Microstructures”, NRL Seminar, Washington, DC, February 1979.  (Invited)

  6     H.I. Smith, “Fabrication and Applications of Submicrometer Structures”, Harvard University, Cambridge, MA, April 1979.  (Invited)

  7     H.I. Smith, “Applications of Artificial Microstructures to Optics”, MIT, Optics Seminar, Cambridge, MA, October 1979.  (Invited)

  8     H.I. Smith, “Fabrication and Applications of Artificial Microstructures”, Raytheon Research Laboratory Seminar, GTE Laboratories, Waltham, MA, November 1979.  (Invited)

  9     H.I. Smith, “Fabrication and Applications of Submicrometer Structures”, GTE Sylvania, Sigma Xi Meeting, Waltham, MA, November 1979.  (Invited)

10     M.W. Geis, D.C. Flanders, D.A. Antoniadis, and H.I. Smith, “Crystallographic Orientation of Silicon on Amorphous Substrates by Graphoepitaxy”, ILO Symposium on Solar Energy, MIT, December 4, 1979.  (Invited)

11     H.I. Smith, “Artificial Microstructures for Integrated Electronics”, Applied Physics Seminar, California Institute of Technology, Pasadena, CA, February 1980.  (Invited)

12     H.I. Smith, “Application of Artificial Microstructures to Chemistry”, Chemistry Seminar, MIT, Cambridge, MA, February 1980.  (Invited)

13     H.I. Smith, “Submicrometer Structures Research and Application”, Digital Equipment Corporation Seminar, Westboro, MA, April 1980.  (Invited)

14     H.I. Smith, A Series of Invited Lectures on Microfabrication, Shaanxi Microelectronics Research Institute, Xian, The People’s Republic of China, May-June 1980.

15     J. Melngailis, “Summary of Submicron Structures Research at MIT”, Standard Telecommunication Lab, Harlow, Essex, England, September 1980.  (Invited)

16     J. Melngailis, “Fabrication of Submicron Size Structures”, American Ceramics Society Meeting, October 1980.  (Invited)

17     J. Melngailis, “Submicron Structures Research, and Surface Acoustic Wave Coupling to Bulk Plate Modes”, Bell Telephone Laboratories, Holmdel, NJ, October 1980.  (Invited)

18     J. Melngailis, “Submicron Structures Research at MIT”, Fall 1980 MIT VLSI Research Review, December 1980.

19     H.I. Smith, “Submicron Structures Research at MIT”, IBM Research Laboratory Seminar, Yorktown Heights, NY, January 1981.  (Invited)

20     J. Melngailis, “Submicron Structures Research at MIT:  Reactive Sputter Etching, Enhanced Raman Effect, and SAW Coupling to Bulk Plate Modes”, Yale University Solid State Seminar, January 1981.  (Invited)

21     H.I. Smith, “Submicron Structures Research at MIT”, IBM, T.J. Watson Research Laboratory Seminar, Yorktown Heights, NY, January 19, 1981.  (Invited)

22     H.I. Smith, “The use of Artificial Surface Structures to Study and Control Nucleation, Growth and Orientation in Thin Films”, Lecture Series, Department of Materials Science and Engineering, MIT, Cambridge, MA, February 1981.  (Invited)

23     H.I. Smith, “Submicron Structures Research at MIT”, IBM, T.J. Watson Research Laboratory Seminar, Yorktown Heights, NY, January 19, 1981.

24     H.I. Smith, “Submicron Structures Research at MIT”, presented at Corporate Research Labs, Exxon Research and Engineering Co., Linden, NJ, April 20, 1981.

25     H.I. Smith, “Fabrication Techniques for Submicron-Period Diffractive Optical Elements”, Seminar on Modern Optics and Spectroscopy, MIT, Cambridge, MA, May 4-5, 1981.  (Invited)

26     H.I. Smith, “Impact of Submicron Structures in Research and Applications”, presented at 1981 Spring Meeting of the National Research Council, Solid State Sciences Committee and Panel, MIT, Cambridge, MA, May 19, 1981.

27     J. Melngailis, “Surface Acoustic Wave Grating Devices”, Solid State Physics Institute, University of Riga, August 1981.  (Invited)

28     J. Melngailis, “Research at Small Dimensions”, Latvian Academy of Sciences, Physic Energetic Institute, August 198l.  (Invited)

29     H.I. Smith, “New Approaches to Single-Crystal Thin Films for Devices and Systems using Surface Patterns”, NATO Advanced Research Institute, Microelectronics Studies and Complexities, Les Deux Alps, France, March 14-20, 1982.

30     R.F. Kwasnick, M.A. Kastner, and J. Melngailis, “Quantum Size Effect in the Conductance of Sub-100 nm Wide FETs”, VLSI Research Review, MIT, Cambridge, MA, May 1982.

31     H.I. Smith, “Graphoepitaxy”, presented at the Institute of Crystallography, Moscow; Ioffa Institute, Leningrad; Tashkent, USSR, September 1982.  (Invited)

32     J. Melngailis, “Submicron Structures Research Projects”, RCA Laboratories, Zurich, Switzerland, November 1982.  (Invited)

33     J. Melngailis, “Submicron Structures Fabrication Methods and Applications”, Digital Equipment Corp., Hudson, MA, March 1983.  (Invited)

34     H.I. Smith, “Silicon-on-Anything for Future Systems”, Fairchild Corp., Key Technologists Seminar, Palo Alto, CA, March 30-31, 1983.

35     H.I. Smith, “Graphoepitaxy and Zone-Melting Recrystallization of Patterned Films”, ILP Seminar, Keidanren Hall, Tokyo, Japan, July 1983.

36     C.V. Thompson, “Control of Crystal Size and Orientation in Thin Films on Amorphous Substrates”, Seminar, Department of Metallurgy and Materials Science, Cambridge University, Cambridge, England, September 1983.  (Invited)

37     R.F. Kwasnick, M.A. Kastner, and J. Melngailis, “Electronic Conduction in Ultra-Narrow Si Inversion Layers”, Physics/Industry Forum, Cambridge, MA, October 1983.

38     C.C. Wong, C.J. Keavney, H.A. Atwater, C.V. Thompson, and H.I. Smith, “Zone Melting Recrystallization of InSb on Oxidized Silicon Wafers”, Fall VLSI Research Review, MIT, December 1983.

39     E.H. Anderson and H.I. Smith, “Fabrication of Periodic Submicron Structures”, Fall VLSI Research Review, MIT, December 1983.

40     H.I. Smith, “Zone Melting Recrystallization of Patterned Films and Low Temperature Graphoepitaxy for SOI”, GTE Laboratories, February 2, 1984.

41     H.I. Smith, “Submicron Structures Fabrication and Its Impact on Crystalline Thin Film”, MIT, ILP Symposium on Electronic Materials Processing, February 14, 1984.

42     C.V. Thompson, “Control of Crystal Size and Orientation in Thin Films on Amorphous Substrates”, Division of Applied Science, Harvard University, Cambridge, MA, March 1984.  (Invited)

43     H.I. Smith, “Zone Melting Recrystallization of Patterned Films and Low Temperature Graphoepitaxy for Silicon on Insulator”, IEEE Meeting, Xerox Corp., Rochester, NY, March 26, 1984.

44     T. Yonehara, H.I. Smith, C.V. Thompson, and J.E. Palmer, “Graphoepitaxy of Ge on SiO2 by Solid-State Surface-Energy-Driven Grain Growth”, Spring VLSI Research Review, MIT, May 21, 1984.

45     H.I. Smith, “Single-Crystal Silicon Films on Amorphous Substrates by Zone-Melting Recrystallization”, SOHIO Corp., Cleveland, OH, June 18, 1984.

46     H.I. Smith, “Patterning and Crystalline Film Formation”, Gordon Research Conference, Brewster Academy, NH, July 8-13, 1984.

47     H.I. Smith, “Submicron-Structure Research at MIT”, Tektronix, Beaverton, OR, August 10, 1984.

48     A.C. Warren, D.A. Antoniadis, H.I. Smith, and J. Melngailis, “Superlattices and One-Dimensional Physics in Inversion Layers using Submicron Period Gate Electrodes”, presented at the MIT Fall VLSI Research Review, Cambridge, MA, December 17, 1984.

49     H.I. Smith, “Application of 0.1 Im Structures to Crystalline Films on Amorphous Substrates and Planar Superlattice Devices in Si”, Bell Laboratories, Holmdel, NJ, January 7, 1985.

50     A.C. Warren, D.A. Antoniadis, H.I. Smith, and J. Melngailis, “Modification of Silicon Electronic Band Structure using Submicron Period Gate Electrodes”, SRC Workshop on Post-Shrink Silicon Devices, Chapel Hill, NC, January 10-11, 1985.

51     H.I. Smith, “Research with Submicron Structures”, EECS Colloquium Series, Spring MIT, April 1, 1985.

52     H.I. Smith, “Submicron-Structures Research at MIT”, presented at the NSF Workshop on “The Future of Microstructure Technology”, October 13-16, 1985, Seabrook Island, SC.  (Also, VLSI Memo No. 85-293 MIT, December 1985).

53     H.A. Atwater, H.I. Smith, and C.V. Thompson, “Enhancement of Grain Growth in Ultra-Thin Germanium Films by Ion Bombardment”, VLSI Review, MIT, December 1985.

54     S.Y. Chou, D.A. Antoniadis, and H.I. Smith, “Application of the Shubnikov-de Haas Effect in Characterization of Sub-100 nm Channel Si MOSFETs”, VLSI Review, MIT, December 1985.

55     H.I. Smith, “Submicron Structures and Quantum-Effect Devices”, Brown Building dedication, MIT, December 6, 1985.

56     H.I. Smith, “Submicron Holographic Lithography”, IAP presentation for Spectroscopy Lab, January 1986.

57     H.I. Smith, “Submicron Structures and Quantum-Effect Devices”, presented at the VLSI Symposium, Santa Clara, CA, January 30, 1986.

58     H.I. Smith, “Submicron Structures and Quantum-Effect Devices”, presented at Hughes Research Laboratory, Malibu, CA, January 31, 1986.

59     H.I. Smith, “The use of Submicron Patterning in Controlling Crystalline Films on Amorphous Substrates”, presented at the Materials Processing Center.  Industry Colloquium Workshop for “Thin Film Processing”, C.V. Thompson Chairperson, April 7, 1986.

60     H.A. Atwater, “Device Quality Crystalline Films on Amorphous Substrates by Zone-Melting Recrystallization and Grain Growth Processes”, presented at the Sohio Research Ctr. Cleveland, OH, April 1986.

61     H.I. Smith, “Submicron Structures Research at MIT”, presented at the Naval Research Laboratory, Washington, DC, July 16, 1986.

62     H.I. Smith, “Fabrication and Physics of Very Short, Very Narrow, and Planar Superlattice MOSFET’s”, MIT Physics/Industry Forum on “Physics in One and Two Dimensions”, Cambridge, MA, October 29-30, 1986.

63     H.I. Smith, Submicron Structures Technology and Future Electronics, presented at Research Laboratory of Electronics MIT, 40th Anniversary Symposium:  Future Directions in Electronics, Cambridge, MA, October 30, 1986.

64     H.I. Smith, “A Comparison of Process Latitude in UV, Deep UV and X-ray Lithography”, IBM Research Center, Yorktown Heights, NY, May 6, 1987.

65     H.I. Smith, “Random Events and Line-edge Control in UV, X-ray and Charged Particle Lithographies”, Gordon Research Conference on Chemistry and Physics of Microstructures, Wolfboro, NH, June 24, 1986.

66     M.A. Kastner, S.B. Field, J.C. Licini, and S.L. Park, “Anomalous Magnetoresistance of the Electron Gas in a Restricted Geometry”, MIT, Fall 1987 Research Review, December 14, 1987.

67     G.G. Shahidi, D.A. Antoniadis, and H.I. Smith, “Reduction of Channel-Hot-Electron-Generated Substrate Current in Sub-150 nm Channel Length Si MOSFETS”, MIT, Fall VLSI Research Review, December 14, 1987.

68     M.L. Schattenburg, I. Tanaka, and H.I. Smith, “Microgap X-ray Nanolithography”, MIT, Fall VLSI Research Review, December 14, 1987.

69     E.H. Anderson and H.I. Smith, “Progress in X-ray Nanolithography Pattern Generation”, MIT, Fall VLSI Research Review, December 14, 1987.

70     H.I. Smith, “Quantum-Effect Electronics:  Sub-100 nm Design Rules”, the Karl Suss 1988 Seminar Series, Bedford, MA, March 8, 1988.

71     H.I. Smith, “X-ray Nanolithography for Quantum-Effect Electronics”, Talk at the ATT Bell Labs, May 6, 1988.

72     H.I. Smith, “Submicron and Nanometer Structures Research:  From Quantum-Effect Electronics to X-ray Optics”, MIT, The Microsystems Technology Laboratories, May 16, 1988.

73     Y.C. Ku and H.I. Smith, “X-ray Mask Technology”, SRC – Techcon 88, Dallas, TX, October 12-14, 1988.

74     H.I. Smith, “X-ray Nanolithography”, Amer. Vac. Soc., Symposium on Nanostructures and Nanofabrication, IBM T.J. Watson Research Center, November 16, 1988.

75     K. Ismail, W. Chu, A. Yen, D.A. Antoniadis, and H.I. Smith, “Surface Superlattice and Quasi-One-Dimensional Quantum Effects in GaAs/AlGaAs Modulation-Doped FETs”, Fall 1988, VLSI Research Review, MIT, December 19, 1988.

76     H. Kawata, J.M. Carter, A. Yen, and H.I. Smith, “Optical Projection Lithography using Lenses with Numerical Apertures Greater than Unity”, Fall, VLSI Research Review, MIT, December 19, 1988.

77     H.I. Smith, “Toward 100 nm Feature Technologies:  Device and Fabrication Issues”, Northern Telecom Electronics, Ltd., Technology Day Symposium, December 16, 1988.

78     H.I. Smith and D.A. Antoniadis, “Lateral Surface Superlattices and Quasi-One-Dimensional Structures in GaAs”, MIT Physics/Industry Forum on “Physics in Semiconductor Microstructures”, Cambridge, MA, February 27-28, 1989.

79     H.I. Smith, “Sub-100 nm Electronic Devices – Fabrication and Transport Studies”, Talk at University of Mass, Boston, MA, April 12, 1989.

80     H.I. Smith, “X-ray Nanolithography”, Talk at the First Canadian Workshop on X-ray Lithography, in Quebec, Canada, April 28, 1989.

81     H.I. Smith, “Recent Advances in Microlithography:  Problems and Solutions”, Guest Speaker at Avco Research TEXTRON, July 12, 1989.

82     H.I. Smith, “Sub-100 nm Electronic Devices and Quantum-Effects Research using X-ray Nanolithography”, presented at University of Glasgow, September 22, 1989.

83     H.I. Smith, “Quantum Effect Electronics”, presented at University of Illinois at Urbana-Champaign, October 26, 1989.

84     H.I. Smith, “Sub-100 nm Electronic Devices and Quantum-Effects Research using X-ray Nanolithography”, presented at University of Tokyo, February 1990.

85     H.I. Smith, “Quantum Effect Electronics using X-ray Lithography”, presented Max Plank Institute, Stuttgart, Germany, May 7, 1990.

86     H.I. Smith, “Electronics from half-micron to 10 nm; How will we manufacture?”  Presented at AT&T Bell Labs, Murray Hill, NJ, June 25, 1990.

87     H.I. Smith, “Electronics from half-micron to 10 nm; How will we manufacture?”  Presented at AT&T Holmdel, NJ, July 18, 1990.

88     H.I. Smith, “Electronics from half-micron to 10 nm; How will we manufacture?”  Presented at Lawrence Berkeley Laborarory, CA, October 17,1990.

89     H.I. Smith, “Electronics from Half-Micron to 10 nm; How will we manufacture”?  Presented at IBM, Almaden Research Center, San Jose, CA, April 11, 1991.

90     H.I. Smith, “Nanolithography:  Some paths less well traveled”, presented at Gordon Conference on the Chemistry and Physics of Microstructure Fabrication”, July 27-31, 1992.

91     A. Kumar, “Coupled Single-Electron Quantum-Dot Devices”, presented at the SRC Graduate Fellows Conference, Research Triangle Park, NC January 27-28, 1993.

92     H.I. Smith, “Nanolithographic Techniques for Optoelectronics”, presented at GTE Laboratories, Waltham, MA, February 11, 1993.

93     H.I. Smith, “Nanostructures Engineering:  Precision, Accuracy, and Manufacturability”, presented at MIT-EECS May 3, 1993.

94     H.I. Smith, “Lithography and the Push to 0.1 µm and Beyond”, presented at IBM Yorktown Heights, NY, June 25, 1993.

95     H.I. Smith, “Present Status and Future Perspective of NanoLithography”, presented at Advanced Research Laboratory, Hitachi, Ltd., June 15, 1994.

96     H.I. Smith, “Sub-100nm Devices, Circuits, and Systems via X-ray Lithography: Technology advancements”, presented at ARPA’s Advanced Lithography Program Review, Scottsdale, AZ January 23-26, 1995.

97     H.I. Smith, “Spatial-Phase-Locked E-beam Lithography Combined With X-ray Lithography”, presented at ARPA’s Advanced Lithography Program Review, Scottsdale, AZ January 23-26, 1995.

98     C.O. Bozler, D.D. Rathman, C.T. Harris, G.A. Lincoln, R.H. Matthews, S. Rabe, R.A. Murphy, M.A. Hollis, and H.I. Smith, “High-Density Gated-Field-Emitter Arrays for Microwave Power Tubes”, presented at VE Program Review, June 1995.

99     H.I. Smith, R. F. Pease, “Report on Optimal Strategy for Developing a Mask Writer” (1995).

100     H.I. Smith, “The Role of Optical Interference in Lithography from 200nm to 10nm”,  presented at MIT-EECS/RLE Seminar Series on Optics and Quantum Electronics,  May 1, 1996.

101     H.I. Smith, “A White Paper on Charged Particle Approaches to Lithography”, presented at the SRC Workshop on Charged Beam Patterning, IBM  East Fishkill, NY, June 18, 1996.

102     H.I. Smith, ” Lithography with Nanometer-level Precision and Accuracy, Do We Need It?”, presented at IBM East Fishkill, NY, September 11, 1996.

103     H.I. Smith,” Maskless, massless sub-50 nm lithography”, presented at Eberhard-Karls-Univerversität, Tübingen (Germany), September 1996.

104     H.I. Smith, “Nanolithography, Not Yet a General Engineering Discipline.  What Remains to be Invented?” presented at the University of Maryland, October 18, 1996.

105     M. Farhoud, “Nano-Structures Research at MIT”, presented at the American University of Beirut, Beirut (Lebanon), December 16, 1996.

106     A. Pepin, “Fabrication of lateral superlattices in GaAs/AlGaAs grid-gated MODFETs by X-ray nanolithography,” Seminar, Physics Department, Boston College, Chestnut Hill, MA, February 14, 1996.

107     H.I. Smith, “X-Ray Nanolithography:  Extension to the Limits of the Lithographic Process”, MIT American Nuclear Society Student Chapter Meeting, Massachusetts Institute of Technology, Cambridge, MA, March 3, 1997.

108     H.I. Smith, “The Limits and Role of Lithography in Future Nanotechnology,” Lecture, NIST, Gaithersburg, MD, April 30, 1997.

109     H.I. Smith, “Fabrication of Spatially-Coherent Planar Optical Devices,” Workshop on High Dielectric Contrast Structure for Microphotonics, Cambridge, MA, June 16, 1997.

110     M. Farhoud,  “Patterned Magnetic Media for Ultra High Density Data Storage,” presented at RWTH-Aachen, Germany on July 3, 1997.

111     H.I. Smith, “The Role of Lithography, Feedback, Templates and Self Organization”, University of Nebraska-Lincoln Corporate Sponsored Electrical Engineering Colloquium Program, April 2, 1998.

112     H.I. Smith, “X-ray mask alignment for MMIC via IBBI”, Technical Interchange Meeting on Next Generation GaAs Industry Lithography Needs held at Sanders Company  in Nashua, NH, May 8, 1998.

113     H.I. Smith, “Interferometric Broad-Band Imaging (IBBI),  presentation given to Lockheed Sanders in Nashua, NH, October 21, 1998.

114     D.J.D. Carter, “X-Ray Lithography in the Deep Sub-100 nm Regime.”  Presented at the Naval Research Laboratory, Washington, DC, December 15, 1998.

115     D.J.D. Carter, “Lithography in the Deep Sub-100 nm Regime.” Talk presented at NTT on 11/11/1998.

116     D.J.D. Carter, “Lithography in the Deep Sub-100 nm Regime”, Talk presented at Toshiba on 11/12/1998.

117     D.J.D. Carter, “Lithography in the Deep Sub-100 nm Regime”, Talk presented at NEC on 11/13/1998.

118     Henry I. Smith, “Nanolithography on limited budgets;  why this is important”, University of Canterbury, Department of Electronic and Electrical Engineering, January 25, 1999.

119     D. Gil, “ZPAL:  A New Maskless Approach”, presented at the MTL poster session, January 11, 1999.

120     H. I. Smith, “Nanostructures at MIT – why I came to Göttingen”,  Forschungseinrichtung Röntgenphysik, Gottingen, Germany, March 24, 1999.

121     H. I. Smith, “Nanolithography in the next century:  How  will it be done and for what applications”, Max-Planck-Institute Fur Strömungsforschung, Göttingen, Germany, April 16, 1999.

122     M. Jalal Khan, M. Lim, Thomas E. Murphy, “Innovative Design and Fabrication Techniques for Integrated Bragg Gratings Filters”, Talk presented at MPC Materials Unlimited, MIT, 5/8/2000.

123     Henry Smith, “Nanolithography for Integrated Microphtonics:   What Can and Cannot be Done”, Talk presented at the Microphotonics seminar on July 13, 2000, MIT.

124     Henry Smith, “Nano-lithography”, SVG Optics Tutorial Workshop, MIT Campus, August 11, 2000.

125     Henry Smith, “Nanostructures Technology, Research and Applications”, Materials Processing Center, MIT, 2000.

126     Henry Smith, “Nanolithography in the next century:  How will it be done and for what applications”, Max-Planck-Institut fur Stromungsforschung, April, 1999.

127     Henry Smith, “Nanostructures Technology:  What’s Behind all the Hype?”, The MIT Report, July/August, 2000.

128     Henry Smith, “The Role of Lithography and the Planar Process”, Innovations in Nanotechnology, MIT Series on Technology and the Corporation, September, 2000.

129     Henry Smith, “The Role of Lithography and the Planar Process”, Korea-U.S. Forum on Nano Science and Technology, Killian Hall, MIT, September, 2000.

130     Henry I. Smith, “The Role of Lithography in Nanotechnology”, Northeastern University Seminar, April 13, 2001.

131     Henry I. Smith, “Nanotechnology & MEMS”, Research Directors Conference 2001, Kresge auditorium, MIT, 4/19/2001.

132     Henry I. Smith, “The Scanning Electron Microscope”, Image and Meaning Conference, Kersge Auditorium, MIT, Cambridge, MA,  June 13-16, 2001.

133     Henry I. Smith, “The Role of Lithography for Nanotechnology”, The MIT Report, July/August 2001.

134     Henry I. Smith, “Nanostructures”, Workshop on Nanostructure Science, Metrology, and Technology, Gaithersburg, MD, September 5-6, 2001.

135     Henry I. Smith, “Building Bridges Between Lithography and Nanotechnology”, University of Illinois, March 1, 2002.

136     Henry I. Smith, “Large-area lithography for microphotonics”, Microphotonics Industry Consortium, MIT Student Center, April 22, 2002.

137     Henry I. Smith, “Templated Self Assembly; the role of nanolithography in the nanotechnology revolution”, CMSE Workshop, MIT 2002.

138     Henry I. Smith, “Templated Self Assembly; the role of nanolithography in the nanotechnology revolution”, Institute for Nanoscience Colloquium, Washington, DC.  1/15/03.

139     Henry I. Smith, “The Role of Nanometer-level Accuracy and Precision in Nanomanufacturing”, 1st International Symposium Nanomanufacturing, Hotel @ MIT, Cambridge, MA.  April 24-26, 2003.

140     J. Todd Hastings, Henry I. Smith, “Integrated Optics and Nanometer-Precision Pattern Placement with E-beam Lithography”, NANO 2004, Raith Users Meeting, Dortmund, Germany, Feb. 2004

141     Henry I. Smith, Tymon Barwicz and Minghao Qi, “Nanofabrication:  Techniques, Applications and Extension to the Molecular Level”.