HOME: NSL - NanoStructures Laboratory

Published Conference Proceedings

1     H.I. Smith, “The Dynamics of Pumping and Desorption in a Bayard-Alpert Ionization Gauge”, Transactions 10th National Vacuum Symposium, 1963, pp. 263 MacMillian Company, New York, NY (1963).

2     H.I. Smith, “The Fabrication of Microsound Components”, IEEE International Convention, New York, NY, Session 2-C, Convention Digest, pp. 90-91, March 24-27, 1969.

3     R.J. Hawryluk and H.I. Smith, “Electron Beam Exposure Profiles in Thin Polymer Films”, pp. 51-67, 5th International Conference, Electron and Ion Beam Science and Technology, Houston, TX, May 7-11, 1972, Ed. R. Bakish 1972, The Electrochemical Society Inc.

4     D.L. Spears, H.I. Smith, and E. Stern, “X-ray Replication of Scanning Electron Microscopy Generated Patterns”, pp. 80-91, 5th International Conference, Electron and Ion Beam Science and Technology, Houston, TX, May 7-11,1972, Ed. R. Bakish 1972, The Electrochemical Society Inc., Princeton, NJ.

5     H.I. Smith, R.C. Williamson, and W.T. Brogan, “Ion Beam Etching of Reflective Array Filters”, pp. 198-201 Proceedings, 1972 Ultrasonics Symposium, Boston, MA, October 4-7, 1972, Ed. J. DeKlerk, Institute of Electrical and Electronics Engineers Inc., 345 E. 47th Street, New York, NY, Catalog #72CHO708-8SU.

6     C.K. Crawford and H.I. Smith, “Directly Heated LaB6 Cathodes Interchangeable with Standard SEM Filaments”, Proceedings 8th National Meeting, Electron Microscope Society of America, New Orleans, LA, August 1973.

7     H.I. Smith, J. Melngailis, R.C. Williamson, and W.T. Brogan, “Ion-Beam Etching of Surface Gratings”, Proceedings IEEE Ultrasonics Symposium, Monterey, CA, November 5-7, 1973, pp. 558-563, Ed. J. DeKlerk, IEEE Inc., New York, NY, Cat. #73CHO807-8SU.

8     R.C. Williamson, V.S. Dolat, and H.I.Smith, “L-Band Reflective-Array Compressor with a Compression Ratio of 5120”, Proceedings Ultrasonics Symposium, Monterey, CA, November 5-7, 1973, pp. 490-493, Ed. J. DeKlerk, IEEE Inc., New York, NY, Cat. #73CHO807-8SU.

9     H.I. Smith, “Fabrication Techniques for Optical and Acoustical Microelectronic Devices”, pp. 221-232, Proceedings of the Symposium on Optical and Acoustical Micro-electronics, New York, NY, April 16-18, 1974.  Published by Polytechnic Press of the Polytechnic Institute of New York, 1975, Microwave Research Institute, Symposia Series, Vol. XXIII, Ed. Jerome Fox.  (Invited paper)

10     R.J. Hawryluk, A. Soares, H.I. Smith, and A.M. Hawryluk, “Experimental Utilization of Monte Carlo Models for Electron Beam Lithography”, pp. 87-94, Proceedings 6th International Conference, Electron and Ion Beam Science and Technology, May 13-16, 1974, San Francisco, CA, Ed. R. Bakish, The Electrochemical Society, Princeton, NJ.

11     S.E. Bernacki and H.I. Smith, “X-ray Lithography Applied to Silicon Device Fabrication”, pp. 34-46, Proceedings 6th International Conference Electron and Ion Beam Science and Technology, May 13-16, 1974, San Francisco, CA.  Ed. R. Bakish, The Electrochemical Society, Princeton, NJ.

12     H.I. Smith, “Electron Beam, Ion Beam, X-ray, and Optical Techniques for Fabricating Surface-Acoustic-Wave and Thin Film Optical Devices”, Proceedings 6th Congress International AVISEM, Toulouse, FRANCE, October 8-11, 1974, Societe Francais du Vide. (Invited paper)

13     H.I. Smith, “Techniques for Making Gap-Coupled Acoustoelectric Devices”, pp. 238-240, Ultrasonics Symposium Proceedings, Los Angeles, CA, September 22-24, 1975.  Ed. J. DeKlerk, IEEE Inc., New York, NY.

14     H.I. Smith, “Ion Beam Etching”, pp. 133-143, Proceedings Symposium on Etching for Pattern Definition, Eds. H.G. Hughes and M.J. Rand, The Electrochemical Society Inc., Washington, DC, May 3-4, 1976.  (Invited paper)

15     H.I. Smith and D.C. Flanders, “X-ray Replication of Submicrometer Linewidth Patterns”, Proc. 35th Annual Meeting Electron Microscope Society of America, p. 136, Boston, MA, August 22-26, 1977, Ed. G.W. Bailey, 1977 Calitor’s Publishing Division, Baton Rouge, LA.  (Invited paper)

16     N.M. Ceglio and H.I. Smith, “An Efficient Lensing Element for X-rays”, Proc. 8th International Conference on X-ray Optics and Microanalysis, Boston, MA, August 18-24, 1977.

17     H.I. Smith and D.C. Flanders, “X-ray Lithography”, Proc. 8th Conference 1976 International on Solid State Devices, pp. 61-65, Tokyo, Japan, September 1-3, 1976.  Japan J. Appl. Phys. Vol. 16, Suppl. 16-1, pp. 61-65 (1977).  (Invited paper)

18     H.I. Smith, D.C. Flanders, and D.C. Shaver, “New Applications of Submicrometer Structures in Materials Science and Biology”, pp. 33-40, Scanning Electron Microscopy, Vol. 1, 1978, Ed. O. Johari, Scanning Electron Microscopy, Inc., AMF O’Hare, IL.  (Invited paper)

19     H.I. Smith, “The Impact of Submicrometer Structures on Future Integrated Electronics”, EASCON ’79, pp. 296-297, Arlington, VA, October 8-11, 1979.  IEEE Electronics and Aerospace Systems Conference, IEEE, New York, NY.

20     M.W. Geis, D.C. Flanders, D.A. Antoniadis, and H.I. Smith, “Crystalline Silicon on Insulators by Graphoepitaxy”, IEEE International Electron Devices Meeting, pp. 210-212, Washington, DC, December 3-5, 1979.

21     H.I. Smith, “Equivalent Data Rate of X-ray Lithography Systems”, Proc. 9th International Conference, Electron and Ion Beam Science and Technology, pp. 425-435, St. Louis, MO, May 1980, Ed. R. Bakish, The Electrochemical Society.

22     D.C. Flanders, D.C. Shaver, A.M. Hawryluk, and H.I. Smith, “Progress in the Fabrication of Artificial Microstructures for X-ray Imaging and Spectroscopy”, Proc. Conf. Ultrasoft X‑ray Microscopy, June 13-15, 1979, New York, NY.  Annals of the New York Academy of Sciences, V342, 203-212 (1980).

23     M.W. Geis, D.A. Antoniadis, D.J. Silversmith, R.W. Mountain, and H.I. Smith, “Silicon Graphoepitaxy”, Proceedings of 12th Conference on Solid State Devices, Tokyo, Japan (1980).  Also, Japan J. Appl. Phys. 20, Supplement 20-1, 39 (1981).  (Invited paper)

24     H.I. Smith, “The Impact of Submicrometer Structures in Research and Applications”, Proc. of the International Conference on Microlithography, September 30 – October 2, 1980, Amsterdam. Ed. R. Kramer, DELFT University Press, The Netherlands (1981).  (Invited paper)

25     A.M. Hawryluk, N.M. Ceglio, R.H. Price, J. Melngailis, and H.I. Smith, “Soft X-ray Spectroscopy using Thick Gold Transmission Gratings of 0.2 to 0.32 µm Spatial Periods”, pp. 286-289, Proc. Topical Conference on Low Energy X-ray Diagnostics, Monterey, CA, June 8-10, 1981.  Eds. D.T. Atwood and B.L. Henke, Amer. Inst. of Physics Conference Proc. No. 75, New York, NY (1981).

26     H.I. Smith, “Fabrication of Diffractive Optical Elements for X-ray Diagnostics”, pp. 223-224 Proc. Topical Conference on Low Energy Diagnostics, Monterey, CA, June 8-10, 1981.  Eds. D.T.Atwood and B.L. Henke, Amer. Inst. of Physics, Conf. Proc. No. 75, New York, NY (1981).  (Invited paper)

27     N.M. Ceglio, M. Roth, and A.M. Hawryluk, “A Streaked X-ray Transmission Grating Spectrometer”, Proc. Topical Conference on Low Energy X-ray Diagnostics, Monterey, CA, June 8-10, 1981; D.T. Atwood, Chairman,  Amer. Inst. of Physics, Conference Proc. No. 75, p. 290 (1981).

28     R. Tatchyn, I. Lindau, E. Kallne, E. Spiller, R. Bartlett, J. Kallne, M. Hecht, J.H. Dijkstra, A.M. Hawryluk, and R.Z. Bachrach, “High Quality Fraunhofer Diffraction Spectra Taken at SSRL in the Soft X-ray Range”, Proc. Topical Conference on Low Energy X-ray Diagnostics, Monterey, CA, June 8-10, 1981; D.T. Atwood, Chairman. Amer. Inst. of Physics, Conference Proc. No. 75, p. 297 (1981).

29     M.W. Geis, H.I. Smith, J.C.C. Fan, B.Y. Tsaur, and J.P. Sallerno, “Preparation of Oriented Silicon Films on Insulating Substrates”, 5th International Conference on Vapor Growth and Epitaxy/5th American Conference on Crystal Growth, Coronado, CA, July 19-24, 1981; A.L. Gentile, Conference Secretariat.

30     H.I. Smith, H.A. Atwater, and M.W. Geis, “Orientation Selection by Zone Melting Silicon Films through Planar Constrictions”, Extended Abstract, 161st Meeting, Electrochemical Society, Montreal, Canada, May 9-14, 1982.

31     H.I. Smith and M.W. Geis, “The Mechanism of Orientation in Si Graphoepitaxy using a Strip-Heater Oven”, Extended Abstract, 161st Meeting, Electrochemical Society, Montreal, Canada, May 9-14, 1982.

32     M.N. Islam, H.A. Haus, and J. Melngailis, “Radiation Loss for Normal and Oblique Incidence Gratings”, IEEE Ultrasonics Symposium.  Cat. #82CH1823-4, p. 92 (1982).

33     D.-P. Chen, J. Melngailis, and H.A. Haus, “Filters Based on Conversion of Surface Acoustic Waves to Bulk Plate Modes in Gratings”, IEEE Ultrasonics Symposium.  Cat. #82CH1823-4, p. 67 (1982).

34     D.T. Atwood, N.M. Ceglio, H.M. Medecki, H.I. Smith, A.M. Hawryluk, T.W. Barbee Jr., W.K. Warburton, J.H. Underwood, B.L. Henke, T.H.P. Chang, M. Hatzakis, D.P. Kern, P.J. Coane, W.W. Molzlen, A.J. Speth, G.L. Stradling, and D.W. Sweeney, “Current Developments in High Resolution X-ray Measurements”, American Institute of Physics Conference Proceedings, Series Editor, H.C. Wolfe, No. 90, Subseries on Optical Science and Engineering No. 2.  Topical Meeting on Laser Techniques for Extreme Ultraviolet Spectroscopy, Boulder, CO (1982).  Eds. T.J. McIlrath and R.R. Freeman.

35     M.W. Geis, H.I. Smith, B.Y. Tsaur, J.C.C. Fan, D.J. Silversmith, R.W. Mountain, and R.L. Chapman, “Zone-Melting Recrystallization of Semiconductor Films”, Laser-Solid Interactions and Transient Thermal Processing of Materials Symposium, Boston, MA, November 1982.  Mat. Res. Soc. Symp. Proc. Vol. 13, 477 (1983), Eds. J. Narayan, W.L. Brown, and R.A. Lemons, North-Holland Publishing Co.

36     N.M. Johnson, M.D. Moyer, L.E. Fennell, E.W. Maby, and H.A. Atwater,  “Detection of Electronic Defects in Strip-Heater Crystallized Silicon Thin Films”, Laser-Solid Interactions and Transient Thermal Processing of Materials Symposium, Boston, MA, November 1982.  Mat. Res. Soc. Symp. Proc. Vol. 13, 491 (1983), Eds. J. Narayan, W.L. Brown and R.A. Lemons, North-Holland Publishing Co.

37     C.J. Keavney, H.A. Atwater, H.I. Smith, and M.W. Geis, “Zone Melting Recrystallization of InSb on Oxidized Silicon Wafers”, Electro-Chemical Society Symposium on III-V Opto-Electronics Epitaxy and Device-Related  Processes, San Francisco, May 1983.  Eds. V.G. Keramidas and S. Mahajan.  Also, Extended Abstracts, 162nd Meeting, The Electrochemical Society, San Francisco, CA, May 8-13, 1983.

38     H.I. Smith, E.H. Anderson, A.M. Hawryluk, and M.L. Schattenburg, “Planar Techniques for Fabricating X-ray Diffraction Gratings and Zone Plates”, Symposium on X-ray Microscopy, Gottingen, FRG, September 14-16, 1983.  Springer Series in Optical Sciences Vol. 43:  X-ray Microscopy, pp. 51-61.  Eds. D. Rudolph and G. Schmahl, Springer-Verlag, Berlin, Heidelburg (1984).  (Invited paper)

39     H.I. Smith, C.V. Thompson, M.W. Geis, H.A. Atwater, C.C. Wong, and T. Yonehara, “Zone Melting Recrystallization of Patterned Films and Low-Temperature Graphoepitaxy”, Energy Beam-Solid Interactions and Transient Thermal Processing Symposium, Boston, MA, November 1983.  Mat. Res. Soc. Symp. Proc. 23, 459 (1984).  Elsevier Science Publishers Co., Eds. N.M. Johnson and J.C.C. Fan (1984).  (Invited paper)

40     C.C. Wong, C.J. Keavney, H.A. Atwater, C.V. Thompson, and H.I. Smith, “Zone Melting Recrystallization of InSb Films on Oxidized Si Wafers”, Energy Beam-Solid Interactions and Transient Thermal Processing Symposium, Boston, MA, November 1983.  Mat. Res. Soc. Symp. Proc. 23, 627 (1984), Elsevier Science Publishing Co., Eds. N.M. Johnson and J.C.C. Fan.

41     T. Yonehara, C.V. Thompson, and H.I. Smith, “Abnormal Grain Growth in Ultra-Thin Films of Germanium on Insulator”, Mat. Res. Soc. Symp. Proc. 25, 517 (1984). ‘Thin-Films and Interfaces’, Elsevier Science Publishing Co., Eds. J. Baglin and D. Campbell.

42     T. Yonehara, H.I. Smith, C.V. Thompson, and J.E. Palmer, “Surface- Energy-Driven Graphoepitaxy in Ultra-Thin Films of Ge”, 1984  International Conference on Solid State Devices and Materials, Kobe, Japan, August 30 – September 1, 1984.  Extended Abstracts of the 16th International Conference on Solid State Devices and Materials, B-10-1, 515-518 (1984).

43     M.W. Geis, H.I. Smith, C.K. Chen, R.W. Mountain, and C.L. Doherty, “The Characterization, Control and Reduction of Subboundaries in Silicon-on-Insulators”, Mat. Res. Soc. Symp. Proc. 35, 575-582 (1985).  Energy Beam-Solid Interactions and Transient Thermal Processing, Materials Research Society, Eds. D.K. Biegelson, G.A. Rozgonyi, C.V. Shank.

44     C.V. Thompson, “Solid Phase Processes for Semiconductor-On-Insulator”, Mat. Res. Soc. Symp. Proc. 35, 711 (1985). Energy-Beam Solid Interactions and Transient Thermal, Eds. D.K. Biegelson, G.A. Rozgonyi, C.V. Shank.

45     A.C. Warren, D.A. Antoniadis, H.I. Smith, and J. Melngailis, “Modification of Silicon Electronic Band Structure using Submicron Period Gate Electrodes”, p. 866, IEEE International Electronic Device Meeting, San Francisco, CA, December 9-12, 1984.

46     M.W. Geis, C.K. Chen, H.I. Smith, R.W. Mountain, and C.L. Doherty, “Recent Advances in SOI Films Produced by Zone-Melting Recrystallization”, Extended Abstracts of the 2nd International Workshop on Future Electron Devices.  SOI Technology and Three-Dimensional Integration (FED SOI/3D Workshop), March 19-21, 1985, Shuzenji, Japan, p. 87, Research and Development Association for Future Electron Devices (1985).

47     C.C. Wong, H.I. Smith, and C.V. Thompson, “Room Temperature Grain Growth in Thin Au Films”, 4th International Symposium on Grain Boundary Structure and Related Phenomena, Supplement to Trans. of Jap. Inst. of Metals 27, 641 (1986).

48      H.-J. Kim and C.V. Thompson, “The Effect of Dopants on Grain Boundary Mobility in Silicon”, 4th International Symposium on Grain Boundary Structure and Related Phenomena”, Japan Institute of Metals, Supplement to Trans. of Jap. Inst. of Metals 27, 495 (1986).

49     C.C. Wong, H.I. Smith, and C.V. Thompson, “Secondary Grain Growth and Graphoepitaxy in Thin Au Films on Submicrometer-Period Gratings”, Mater. Res. Soc. Symp. Proc. 47, 35 (1985).

50     H.A. Atwater, H.I. Smith, and C.V. Thompson “Enhancement of Grain Growth in Ultra-Thin Germanium Films by Ion Bombardment”, Mat. Res. Soc. Symp. Proc. 51, 337 (1986), Eds. H. Kurz, G.L. Olson, J.M. Poate.  (Invited paper)

51     H.I. Smith, M.W. Geis, C.V. Thompson, and C.K. Chen, “Crystalline Films on Amorphous Substrates by Zone Melting and Surface-Energy-Driven Grain Growth in Conjunction with Patterning”, Mat. Res. Soc. Symp. Proc. 53, 39 (1986).  Eds. A. Chiang, M.W. Geis, L. Pfeiffer.

52     M.W. Geis, C.K. Chen, H.I. Smith, P.M. Nitishin, B.-Y. Tsaur, and R.W. Mountain, “Elimination of Subboundaries from Zone-Melting-Recrystallized Silicon-On-Insulator Films”, Mat. Res. Soc. Symp. Proc. 53, 39 (1986).

53     C.V. Thompson and H.I. Smith, “Secondary Grain Growth in Thin Films”, Phase Transitions in Condensed Systems – Experiment and Theory, Mat. Res. Soc. Symp. Proc. 57, 499 (1987).  Eds. G.S. Cargill III, F. Spaepen K.N. Tu.

54     H.J. Kim and C.V. Thompson, “The Effects of Dopants on Surface-Energy-Driven Grain Growth in Ultrathin Si Films”, presented at Fall Meeting of the Materials Research Society, Boston, MA, December 2-6, 1985, Mat. Res. Soc. Symp. Proc. 54, 730 (1986).

55     S.Y. Chou, D.A. Antoniadis, and H.I. Smith, “Application of the Shubnikov-de Haas Effect in Characterization of Sub-100 nm Channel Si MOSFETs”, IEEE International Electron Devices Meeting, Washington, DC, December 1985, IEDM Technical Digest, 562‑564 (1985).

56     D.A. Antoniadis, A.C. Warren, and H.I. Smith, “Quantum Mechanical Effects in Very Short and Very Narrow Channel MOSFETs”, IEEE International Electron Devices Meeting, Washington, DC, December 1985, IEDM Technical Digest, 558-561 (1985).

57     C.R. Canizares, M.L. Schattenburg, and H.I. Smith, “High Energy Transmission Grating Spectrometer for AXAF”, SPIE Vol. 597, 253 X-ray Instrumentation in Astronomy Society of Photo-Optical Instrumentation Engineers (1985).

58     S.Y. Chou, C.S. Lam, D.A. Antoniadis, H.I. Smith, and C.G. Fonstad,  “Characterization of Modulation-Doped FET’s using Shubnikov-de Haas Oscillations”, Proc. 13th  International Symposium on Gallium Arsenide and Related Compounds, Las Vegas, NV, September 28 – October 1, 1986, Ed. W.T. Lindley, Inst. Phys. Conf. Ser. No. 83, Chapter 4, p. 239-244.

59     H.I. Smith, “A Statistical Analysis of Microlithography”, presented at the 18th International Conference on Solid State Devices & Materials, Tokyo, Japan, August 20-22, 1986.  Also, in Extended Abstracts of the 18th (1986 International) Conference on Solid State Devices and Materials, p. 13 (1986), Japan Society of Applied Physics, Business Center for Academic Societies Japan, 40-14, Hongo-2-chome, Bunkyo-ku, Tokyo.

60     I. Plotnik, M.E. Porter, M. Toth, S. Akhtar, and H.I. Smith, “Ion-Implant Compensation of Tensile Stress in Tungsten Absorber for Low Distortion X-ray Masks”, Proc. 1986 International Conference on Microlithography and Related Microelectronics Technologies, September 23-25, 1986, Interlaken, Switzerland p. 51, Eds. H.W. Lehmann and Ch. Bleiker, Elsevier, 1986.  Also, Microelectronic Engineering 5, 51 (1986).

61     H.A. Atwater, H.I. Smith, and C.V. Thompson, “Ion Beam Enhanced Grain Growth in Thin Films”, Beam-Solid Interactions and Transient Processes Symposium, Materials Research Society Meeting, December 1986.  Mat. Res. Soc. Symp. Proc. 74, 499 (1987).

62     M.W. Geis, C.K. Chen, and H.I. Smith, “Elimination of Subboundaries in 0.5-µm-thick Si‑on‑Insulator Films Produced by ZMR”, Beam-Solid Interactions and Transient Processes Symposium, Mat. Res. Soc. Meeting, December 1986.

62(a)G.G. Shahidi, D.A. Antoniadis, and H.I. Smith, “Electron Velocity Overhshoot at 300K and 77K in Silicon MOSFETs with Submicron Channel Lengths”, IEEE International Electron Devices Meeting, Los Angeles, CA, December 1986, IEDM Technical Digest, 824 (1986).

63     J.S. Im, C.V. Thompson, and H. Tomita, “Solidification Morphologies in Zone-Melting Recrystallization”, Beam-Solid Interactions and Transient Processes Symposium, Materials Research Society Meeting, December 1986, Mat. Res. Soc. Symp. Proc. 74, 555 (1987).

64     R.C. Cammarata, C.V. Thompson, and S.M. Garrison, “Secondary Grain Growth during Rapid Thermal Annealing of Doped Polysilicon Films”, presented at Spring Materials Research Society Meeting, 1987 Mat. Res. Soc. Symp. Proc. 92, 335 (1987).

65     D.A. Antoniadis, “Quantum Mechanical and Non-Steady-State Transport Phenomena in Nanostructured Silicon Inversion Layers”, Extended Abstracts, 19th Conference on Solid State Devices and Materials, August 25-27, 1987, The Japan Society of Applied Physics, Tokyo, Japan.

66     E.H. Anderson, D. Kern, and H.I. Smith, “Fabrication by Tri-Level Electron Beam Lithography of X-ray Masks with 50 nm Linewidths and Replication by X-ray Nanolithography”, Microcircuit Engineering Proc. International Conference on Microlithography, September 22-25, l987, Paris, France, pg. 541, Eds. R. Castagne and J. Perrocheau, Elsevier, 1987.  Also, Microelectronic Engineering 6, 541 (1987).

67     M.L. Schattenburg, I. Tanaka and H.I. Smith, “Microgap X-ray Nanolithography”, Microcircuit Engineering Proc. International Conference on Microlithography, September 22-25, l987, Paris, France, pg. 273, Eds. R. Castagne and J. Perrocheau, Elsevier, 1987.  Also, Microelectronic Engineering 6, 273 (1987).

68     H.A. Atwater, C.V. Thompson, and H.I. Smith, “Transition State Model for Grain Boundary Motion during Ion Bombardment”, Mat. Res. Soc. Symp. Proc. 100, 345 (1988).

69     C.R. Canizares, M.L. Schattenburg, D. Dewey, A.M. Levine, T.H. Markert and H.I. Smith, “Transmission Grating Spectroscopy and The Advanced X-ray Astrophysics Facility (AXAF)”, SPIE’s 32nd Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, San Diego, CA, August 14-19, 1988.

70     K. Ismail, W. Chu, D.A. Antoniadis, and H.I. Smith, “Superlattice Effect in A Grid-Gate GaAs/AlGaAs MODFET Structure”, Conference on Gallium Arsenide and Related Compounds, Atlanta, GA, September 12-14, 1988.

71     Y.C. Ku and H.I. Smith, “X-ray Mask Technology”, Techcon ’88, Semiconductor Research Corporation, Dallas, TX, October 12-14, 1988.

72     H. Kawata, J.M. Carter, A. Yen, and H.I. Smith, “Optical Projection Lithography using Lenses with Numerical Apertures Greater than Unity”, Microcircuit Engineering ’88, Vienna, Austria September 21-24, 1988.  Microelectronic Engineering 9, 31-36 (1989).

73     H.I. Smith, K. Ismail, W. Chu, A. Yen, Y.C. Ku, and D.A. Antoniadis,”X-ray Nanolithography and Quantum-Effect Electronics”, Molecular Electronics-Science and Technology, Engineering Foundation Conferences, Keauhou Kona, Hawaii, February 19-24, 1989.  Molecular Electronics-Science and Technology, pp. 107-118, Ed. Ari Aviram, Engineering Foundation, New York, NY (1989).

74     H.I. Smith, K. Ismail, W. Chu, A. Yen, Y.C. Ku, M.L. Schattenburg, and D.A. Antoniadis, “Fabrication of Quantum-Effect Electronic Devices using X-ray Nanolithography”, Proceedings of the International Symposium on Nanostructure Physics and Fabrication, pp. 57-65, Eds. M.A. Reed, and W.P. Kirk Academic Press, San Diego, CA (1989).

75     C.T. Liu, K. Nakamura, D.C. Tsui, K. Ismail, D.A. Antoniadis, and H.I. Smith, “Far-Infrared Transmission Measurements on Grid-Gate GaAs/AlGaAs Lateral-Surface-Superlattice Structures”, Proc. of the 4th International Conference on Modulated Semiconductor Structures, p. 819, Ann Arbor, MI (1989).

76     D.A. Antoniadis, K. Ismail, and H.I. Smith, “Lateral Surface Superlattices and Quasi-One-Dimensional Structures in GaAs”, presented at the “Science and Engineering of One-and Zero-Dimensional Semiconductors”, NATO Advanced Research Workshop, 29 March 29 – April 1, 1989, Cadiz, Spain, Science & Engineering of One-and Zero-Dimensional Semiconductors, Ed. S.P. Beaumont and C.M. Stotmajor Torres, Plenum Press, (1990).

77     H.I. Smith, K. Ismail, M.L. Schattenburg, and D.A. Antoniadis,  “Sub-100 nm Electronic Devices and Quantum-Effects Research using X-ray Nanolithography”, Microelectronic Engineering 11, 53-59 (1990).

78     Y.C. Ku, H.I. Smith, and I. Plotnik, “Low Stress Tungsten Absorber for X-ray Masks”, Microelectronic Engineering 11, 303-308 (1990).

79     A. Yen, R.A. Ghanbari, E.H. Anderson, and H.I. Smith, “Fabrication of 100 nm Period Gratings using Achromatic Holographic Lithography”, Microelectronic Engineering 11, 201‑205 (1990).

80     K. Early, M.L. Schattenburg, and H.I. Smith, “Absence of Resolution Degradation in X-ray Lithography for l from 4.5 nm to 0.83 nm”.  Microelectronic Engineering 11, 317-321 (1990).

81     J.A. Floro and C.V. Thompson, “Epitaxial Grain Growth and Orientation Metals Metastability in Heteroepitaxial Thin Films”, Mat. Res. Soc. Symp. Proceedings 187, 273 (1990).

82     C.T. Liu, D.C. Tsui, M. Santos, M. Shayegan, K. Ismail, D.A. Antoniadis, and H.I. Smith, “Magnetoresistance of Two-Dimensional Electrons in a Two-Dimensional Lateral Surface Superlattice”, Materials Research Society Fall Meeting, Boston, MA 1990, Mat. Res. Soc. Extended Abstract EA-26, 95 (1990).

83     C.C. Eugster, J.A. del Alamo, P.A. Belk, and M.J. Rooks, “Criteria for One-Dimensional Transport in Split-Gate Field-Effect Transistors”, International Electron Devices Meeting (IEDM) 1990, Technical  Digest 90, 335 (1990).

84     T. H. Markert, M.L. Schattenburg, T. Isobe, J. Bauer, C. Canizares, J. O’Connor, J. Porter, and H.I. Smith, “Investigations of Materials for Ultra-Thin Window X-ray Detectors”, presented at 177th Meeting of the American Astronomical Society, Philadelphia, PA, January 13-17, 1991.  Abstract in Bull. Am. Astron. Soc. 22, 1260 (1990).

85     C.T. Liu, D.C. Tsui, M. Shayegan, K. Ismail, M. Burkhardt, D.A. Antoniadis, and H.I. Smith, “Observation of Landau Level Splitting in Two-Dimensional Lateral Surface Superlattices”, 20th International Conference on “The Physics of Semiconductors”, Thessaloniki, Greece, August 6-10, 1990, Vol. 2, eds. E.M. Anastassakis, J.D. Joannopoulos, World Scientific Publishing Co.

86     A. Toriumi, K. Ismail, M. Burkhardt, D.A. Antoniadis, and H.I. Smith, “Resonant Magneto-Conductance in a Two-Dimensional Lateral-Surface-Superlattice”, 20th International Conference on the  “The Physics of Semiconductors”, Thessaloniki, Greece, August 6-10, 1990, Vol. 2, eds. E.M. Anastassakis, J.D. Joannopoulos, World Scientific Publishing Co.

87     87  A. Yen, R.A. Ghanbari, Y.-C. Ku, W. Chu, M.L. Schattenburg, J.M. Carter, and H. I. Smith, “X-ray Masks with Large-Area 100 nm Period Gratings for Quantum-Effect Device Applications”, Microelectronic Engineering 13, 271-274 (1991).

88     M. L. Schattenburg and H.I. Smith, “X-ray Nanolithography – the Clearest Path to 0.1 and Sub-0.1 µm ULSI”, Proc. of International MicroProcess Conf., Kanazawa, Japan, July 15-18, 1991, JJAP Series 5, pp. 63-70 (1991).

89     N.H. Karam, V. Haven, K. Ismail, F. Legoues, J. Carter, and H.I. Smith, “A New Approach for Low Defect Density GaAs on Patterned Si Substrates by MOCVD”, Materials Research Society Spring Meeting, Anaheim, CA, April 29, 1991, Mat. Res. Soc. Symp. Proc. 221, 309 (1991).

90     D.A. Antoniadis and J.E. Chung, “Physics and Technology of Ultra Short Channel MOSFET Devices”, International Electron Devices Meeting (IEDM), Technical Digest, 21 (Dec. 1991).

91     H.I. Smith and M.L. Schattenburg, “Proximity X-ray Nanolithography”, OSA Proceedings on Soft X-ray Projection Lithography, Jeffrey Bokor, ed. (Optical Society of America, Washington, DC), 12, 148-149 (1991).

92     T.H. Markert, J.M. Bauer, C.R. Canizares, T. Isobe, S. Nenonen, J. O’Connor, M.L. Schattenburg, H.I. Smith, K.A. Flanagan, M.V. Zombeck, “Proportional Counter Windows for the Bragg Crystal Spectrometer on AXAF”, SPIE Conference on EUV, X-ray and Gamma Instruments for Astronomy II, San Diego, CA, July 24-26, (1991).

93     Y. Zhao, D.C. Tsui, K. Hirakawa, M. Santos, M. Shayegan, R.A. Ghanbari, D.A. Antoniadis, and H.I. Smith, “Far Infrared Magneto-Absorption by the 2DEG in GaAs/AlGaAs Heterostructures with Grid Gates”, presented at 21st International Conference on the Phyiscs of Semiconductors, Aug. 10-14, 1992 Bejing, China.

94     K. Early, M.L. Schattenburg, D.B. Olster, M.I. Shepard, and H.I. Smith, “Diffraction in Proximity X-ray Lithography:  Comparing Theory and Experiment for Gratings, Lines, and Spaces”, Microelectronic Engineering 17, 149-152 (1992).

95     W. Chu, M.L. Schattenburg, and H.I. Smith, “Low-Stress Gold Electroplating for X-ray Masks”, Microelectronic Engineering 17, 223-226 (1992).

96     H.I. Smith and M.L. Schattenburg, “Lithography for Manufacturing at 0.25 Micrometer and Below”, Crucial Issues in Semiconductor Materials and Processing Technologies, NATO ASI Series E, Applied Sciences -Vol. 222, p. 153, eds. S. Coffa, F. Priolo, E. Rimini, and J.M. Poate (Kluwer:  Dordrecht, The Netherlands), 1992.

97     P.F. Bagwell, A. Kumar, and R. Lake, “Scattering and Quantum Localization of Electrons in a Waveguide by Static and Time-Varying Potentials”, Chapter 2, p 45, Quantum-Effect Physics Electronics & Applications, Inst. of Physics Publishing Ltd., Bristol England, and Philadelphia, ed. by K. Ismail, T. Ikoma, and H.I. Smith (1992).

98     H.I. Smith and M.L. Schattenburg, “Why Bother with X-ray Lithography?”  Proc. SPIE Symposium Microlithography, 1671, 228-298, San Jose, CA, March 8-9, 1992.

99     M.L. Schattenburg, J. Carter, W. Chu, R.C. Fleming, R.A. Ghanbari, M. Mondol, N. Polce, and H.I. Smith, “Mask Technology for X-ray Nanolithography”, Mat. Res. Soc. Symp. Proc. 306, 63-68 (1993).

100     S.D. Hector and H.I. Smith, “Soft X-ray Projection Lithography using Two Arrays of Phase Zone Plates”, OSA Proceedings on Soft X-ray Projection Lithography, Andrew M. Hawryluk and Richard H. Stulen, eds. (Optical Society of America, Washington, DC), 18, 202-206 (1993).

101     S.D. Hector, H.I. Smith, N. Gupta, and M.L. Schattenburg, “Optimizing Synchrotron-Based X-ray Lithography for 0.1 µm Lithography”.  Microelectronic Engineering, 23, 203-206 (1994).

102     H.I. Smith and M.L. Schattenburg, “X-ray Nanolithography: Limits, and Application to Sub-100 nm Manufacturing”, presented at the NATO Workshop on Nanolithography, Rome, Italy April 6-8, 1993;  Nanolithography:  A Borderland between STM, EB, IB, and X‑Ray Lithographies, pp. 103-119, Eds. M. Gentili, et al, Kluwer Academic Publishers, Netherlands (1994).

103     Y. Zhao, D.C. Tsui, M.B. Santos, M. Shayegan, R.A. Ghanbari, D.A. Antoniadis, H.I. Smith, and K. Kempa, “Mode Softening of Coupled Quantum Wires”, submitted to 10th International Conference on the Electronic Properties of Two-Dimensional Systems Salva Regina University, Newport, Rhode Island May 31-June 4, 1993.

104     H. Hu, L.T. Su, I.Y. Yang, D.A. Antoniadis, and H.I. Smith, “Channel and Source/Drain Engineering in High-Performance Sub-0.1 µm NMOSFETs using X-ray Lithography”, 1994 Symposium on VLSI Technology Digest of Technical Papers, pp. 17-18, (IEEE cat. No. 94CH3433-0, JSAP cat. No. AP 941211) Honolulu, Hawaii, June 7-9, 1994.

105     M.L. Schattenburg, R.J. Aucoin, R.C. Fleming, I. Plotnik, J. Porter and H.I. Smith, “Fabrication of High Energy X-Ray Transmission Gratings for AXAF”, submitted to SPIE Proceedings 2280, EUV, X-ray and Gamma-Ray Instrumentation for Astronomy V, San Diego, CA, July 24-29, 1994.

106     J.N. Damask, J. Ferrera, V.V. Wong, H.I. Smith, and H.A. Haus, “Limitations and Solutions for the Use of Integrated l/4-Shifted Distributed Bragg Resonators in Wavelength-Division Multiplexing Applications”, International Symposium on Integrated Optics ’94, Lindau, Germany, April 13-14, 1994, proceedings titled Nanofabrication Technologies and Device Integration, Wolfgang Karthe, Chair/Editor; SPIE, v 2213, pp. 137-151 (1994).

107     M. Burkhardt, S. Silverman, H.I. Smith, D.A. Antoniadis, K.W. Rhee, and M.C. Peckerar, “Gap Control in the Fabrication of Quantum-Effect Devices Using X-Ray Nanolithography”, Microelectronic Engineering, 27, 307-310 (1995).

108     I.Y. Yang, C. Vieri, A. Chandrakasan, and D.A. Antoniadis, “Back Gated CMOS on SOIAS for Dynamic Threshold Voltage Control”, IEDM Technical Digest, p. 877, 1995.

109     C. Vieri, I.Y. Yang, C. Chandrakasan, and D.A. Antoniadis, “SOIAS:  Dynamically Variable Threshold SOI with Active Substrate”,  Symposium on Low Power Electronics, Digest of Technical Papers, p.86, 1995.

110     A. Chandrakasan,  I. Yang, C. Vieri, and D.A. Antoniadis, “Design Considerations and Tools for Low-voltage Digital System Design”, IEEE/ACM Design Automation Conference, pp. 113-118,  June 1996.

111     D. Berman, R.C. Ashoori, and H.I. Smith, “Single Electron Transistors for Charge Sensing in Semiconductors”, Proceedings of the International Conference on Quantum Devices and Circuits,  K. Ismail, S. Bandyopadhyay, and J.P. Leburton, eds., (World Scientific,  New Jersey) p. 217-223, 1996.

112     E.M. Koontz, G.S. Petrich, L.A. Kolodziejski, M.H. Lim, V.V. Wong, H.I. Smith, and M.S. Goorsky and K.M Matney,  “Overgrowth of InGaAsP Materials on Rectangular-Patterned Gratings using GSMBE,”  Proceedings of the Ninth International Conference on InP and Related materials, IEEE, Piscataway, NJ, p. 62-65, (1997).

113     J. Goodberlet, S. Silverman, J. Ferrera, M. Mondol, M.L. Schattenburg, and H.I. Smith, “A One-Dimensional Demonstration of Spatial-Phase-Locked Electron-Beam Lithography”, Microelectronic Engineering  35, pp. 473-476, (1997).

114     J.S. Foresi, P.R. Villeneuve, J. Ferrera, E.R. Thoen, G. Steinmeyer, S. Fan, J.D. Joannopoulos, L.C. Kimerling, H.I. Smith, E.P. Ippen, “Measurements of Photonic Band Gap Waveguide Microcavities at l=1.564  mm,” CLEO, Baltimore, Maryland, 1997.

115     H.I. Smith, “Recent Progress in X-ray Technology at MIT”, 1997 International Workshop on X-ray and Extreme Ultraviolet Lithography, Pacifico Yokohama, Japan, July 13-15, 1997.

116     D.J. Twisselmann, B.T. Adekor, M. Farhoud, Henry I. Smith, P.C. Dorsey and C.A. Ross, “In-Plane Anisotropy in CoCr(Ta,Pt)/Cr Films Deposited Onto Substrates With Controlled Topography”, in press, Proc. Materials Research Society 571  193-8, (1998).  (MRS Spring, 3/98)

117     D.G. Pflug, M. Schattenburg, H.I. Smith and A.I. Akinwande, “100nm Aperture field Emitter Arrays for Low Voltage Applications”, IEDM Technical Digest, San Francisco, CA. pp. 855—858, 1998.

118     C.A. Ross, T.A. Savas, H.I. Smith, M. Hwang and R. Chantrell, “Modelling of Hysteresis Loops of Arrays of 100 nm Period Nanomagnets”, Intermag 99, Korea, May 1999.

119     J.Goodberlet, “A Very-High-Density Scintillation-Data-Storage Device”, Microelectronic Engineering 46 (1999) 145-148.

120     D.J.D. Carter, H.I. Smith, K.W. Rhee and C. Marrian,  “Sub-40nm pattern replication with +/- 20% process latitude by soft contact x-ray lithography”, Proceedings of SPIE’s 24th  Annual International Symposium on Microlithography, Emerging Lithographic Technologies III, 14-19 March 1999,  Santa Clara, CA.  SPIE  3676, pp.70-78 (1999).

121     D.J.D. Carter, D. Gil, R. Menon, I. J. Djomehri and Henry I. Smith,  “Zone-Plate Array Lithography (ZPAL): A new maskless approach”, Proceedings of SPIE’s 24th Annual International Symposium on Microlithography, Emerging Lithographic Technologies III 14-19 March 1999, Santa Clara, CA.  SPIE  3676, pp.324-332 (1999).

122     T. E. Murphy, B. E. Little and H. I. Smith, “Wavelength-and Polarization-Insensitive Integrated Directional Couplers using Mach-Zehnder Structures,” in Integrated Photonics Research, OSA Technical Digest, pp. 138-140 (1999).

123     J.G. Goodberlet, B.L. Dunn ,“Deep-Ultraviolet Contact Photolithography”,  Micro & Nano Engineering, 1999., 11-12. (1999).

124     R. Menon, D.J.D. Carter, D. Gil and H.I. Smith, “Zone-plate-array lighography (ZPAL):  Simulations for System Design”, In X-Ray Microscopy:  Proceedings of the Sixth International Conference, Berkeley, CA, 2-6 August 1999., 647-651 American Institute of Physics, 2000.

125     J.T. Hastings, F. Zhang, J.G. Goodberlet and H.I. Smith, “Improved Pattern-Placement Accuracy in E-Beam Lithography Via Sparse-Sample Spatial-Phase Locking”, Microelectronic Engineering 53,  361—364, 2000.

126     H. I. Smith, D. J. D. Carter, M. Meinhold, E.E. Moon, M.H. Lim, J. Ferrera, M. Walsh, D. Gil, R. Menon, “Soft X-Rays for Deep Sub-100 nm Lithography, with and without masks”, Microelectronic Engineering 53, 77—84, 2000.

127     Euclid E. Moon, Patrick N. Everett, Mitchell W. Meinhold and Henry I. Smith, “Dynamic three-Dimensional Mask-Wafer Positioning with Nanometer Exposure Overlay Accuracy”, Jpn. J. Appl. Phys. Vol. 39, pp. 7040-7043, Part 1, No. 12B, December 2000.

128     Henry I. Smith, “Patterning Accuracy in X-ray Lithography, New  Approaches and Applications”, XEL 2000 Conference, Yokohama, Japan,  M1-3, November, 2000.

129     H. I. Smith, D. Carter, D. Gil and R. Menon, “Zone-Plate Array Lighography (ZPAL):  A Maskless Approach Extendible to 20 nm”, XEL 2000 Conference, Yokohama, Japan,  7-1, November, 2000.

130     Henry Smith, “The Role of Lithography and the Planar Process”, Proceedings, Korea-U.S. Forum on Nano Science and Technology, p. 58-71,  Cambridge,  September, 2000.

131     M. Hwang, M. Farhoud, Y. Hao, M. Walsh, T.A. Savas, H.I. Smith and C. A. Ross, “Major hysteresis loop modelling of two-dimensional arrays of single-domain particles”, IEEE Transactions on Magnetics, 36(5), pp. 3173-3175, September 2000.

132     H. Bergner, L.M. Cohen, M.L. Schattenburg and  G. Monnelly, “Precision assembly station for high-resolution segmented optics”, Proc. SPIE 4138, X-Ray Optics, Instruments and Missions IV, Eds. R. B. Hoover and A.B.C. Walker, 134-145 (2000).

133     Glen P. Monnelly, Olivier Mongrard, David Breslau, Nat Butler, Carl G. Chen, Lester Cohen, Wendy Gu, Ralf K. Heilmann, Paul T. Konkola, George R. Ricker, and Mark L. Schattenburg, “High-Accuracy X-ray Foil Optic Assembly”, Proc. SPIE 4138, X-Ray Optics, Instruments and Missions IV, eds. R.B. Hoover and A.B.C. Walker, 164-173 (2000).

134     K.A. Flanagan, T.H. Markert, J.E. Davis, M.L. Schattenburg, R.L. Blake, F. Scholze, P. Bulicke, R. Fliegauf, S. Kraft, G. Ulm, E.M. Gullikson, “Modeling the Chandra High Energy Transmission Gratings below 2 keV” Proc. SPIE 4140, X –Ray and Gamma-Ray Instrumentation for Astronomy  XI, pp. 111-122, Eds. K.A. Flanagan and O.H.W. Siegmund, 2000.

135     R. Petre, L.M. Cohen, D.A. Content, J.D. Hein, T. Saha, M. Schattenburg, and W. Zhang, “Progress towards Meeting the Constellation-X Performance Goals using segmented X-ray Mirrors”, Proc. SPIE 4138 pp. 16-24, 2000.

136     Y. Hao, M. Walsh, C.A. Ross, H.I. Smith, J. Wang, L. Malkinski, “In-plane anisotropy in arrays of magnetic ellipses”, IEEE Trans. Magn. 36(5), 2996-2998. (2000).

137     David G. Pflug, Mark Schattenburg, Henry I. Smith and Akintunde I. Akinwande, “Field Emitter Arrays for Low Voltage Applications with sub 100 nm apertures and 200 nm period”. Presented at the 2001 IEDM, 2-5 December, Washington, DC  pp. 179-182.

138     M.L. Schattenburg, C.G. Chen, R.K. Heilmann, P.T. Konkola and G.S. Pati, “Progress towards a general grating patterning technology using phase-locked scanning beams”, Proceedings of the SPIE, Vol. 4485, 378-384  (2002).

139     Mark L. Schattenburg and Henry I. Smith, “The critical role of metrology in nanotechnology”, Proceedings of the SPIE, Nanostructure Science, Metrology, and Technology, Martin C. Peckerar and Michael T. Postek, Jr.  Chairs/Editors, Vol. 4608, pages 116-124, Gaithersburg, MD, (2001).

140     M. Shima, M. Hwang. M. Farhoud, T. A. Savas, A. Tkzacyk, H. I. Smith, C. A. Ross, W. Schwarzacher, “Fabrication and magnetic properties of arrays of electrodeposited cylinders”, Proc. Electrochem. Soc. PV2000-29 p.111 (2001)

141     C. G. Chen, P. T. Konkola, R. K. Heilmann, C. Joo and Mark Schattenburg, “Nanometer-accurate Grating Fabrication with Scanning Beam Interference Lithography”, Published in Proc.  SPIE 4936, pp. 126-134,  (2003).

142     R. Menon, D. Gil, H. I. Smith, “Zone-plate-array lithography: a  maskless fast-turn-around system for microoptic device fabrication”, Invited Paper at the Photonics West 2003, 25-31 January 2003, San Jose Convention Center, San Jose, CA USA, Published in the Proceedings of Micromachining and Microfabrication, San Jose, CA, January 25-31, 2003. SPIE vol. 4984, pp.10-17, 2003

143     S. M. Jurga, C. Hidrovo, J. Niemczura, H. I. Smith, and G. Barbastathis, Nanostructured origami,IEEE Nanotechology 2003, San Francisco, CA, Aug 12-14 (paper TR-4).

144     Dario Gil, Rajesh Menon, Henry I. Smith, “The promise of diffractive optics in maskless lithography”, Microelectronic engineering, 73-74 (2004) 35-41.

145     Milos A. Popovic, Michael R. Watts, Tymon Barwicz, Peter T. Rakich, Luciano Socci, Erich P. Ippen, Franz X. Kartner and Henry I. Smith, “High-index-contrast, wide-FSR microring-resonator filter design and realization with frequency-shift compensation”

AWAITING PUBLICATION:

A     G.D. U’Ren, K.M. Matney, M.S. Goorsky, M. Wormington, E.M. Koontz, M.H. Lim, V.V. Wong, G.S. Petrich, L.A. Kolodziejski, and H.I. Smith, “Triple Axis diffraction Studies of InGaAsP/InP Epitaxial Overgrowth Grating Structures”, to be published in The 46th Annual Denver X-ray Conference Proceedings.

B     Minghao Qi, Steven G. Johnson, John D. Joannopoulos and Henry Smith, “Fabrication of three-dimensional photonic crystals with midgap wavelength at 1.55 um”,  Conference  on Lasers and Electro-Optics”, June 1-6, Baltimore, Maryland 2003.

C     Tymon Barwicz, Milos A. Popoviae, Peter T. Rakich, Michael R. Watts, Hermann Haus, Erich Ippen and Henry I. Smith, “Fabrication and analysis of add-drop filters based on microring resonators in SiN”, submitted to OFC:04 (Optical Fiber Communication Conference) in Los Angeles CA from Feb 22-27, 2004.

D     Ytshak Avrahami, Milos A. Popovic, Tymon Barwicz, Peter T. Rakich, Michael R. Watts, Francisco Lopez-Royo, Fabrizio Giancometti, Mark Beals, Lionel C. Kimerling, Henry I. Smith, Hermann A. Haus, Harry L. Tuller, George Barbastathis, “MEMS enabled optical switching with high-index contrast ring resonator filters. (submitted to OFC:04 (Optical Fiber commnication Conference) in Los Angeles, CA. Feb 22-27, 2004.

E     Hyun Jin In, Will Arora, Tilman Buchner, Stanley M. Jurga, Henry I. Smith, George Barbastathis, “The Nanostructured Origami 3D Fabrication and Assembly Process for Nanomanufacturing”, IEEE Nano 04, Munich, Germany.

F     G. Barbastathis, R. Menon, and H. I. Smith, “Zone plate array optimization for maskless lithography”, Abstract accepted for publication to 2nd International Conference on Advanced Materials and Nanotechnology, Canterbury, New Zealand, February 2005.

G     T. Barwicz, “/3D Analysis of Scattering Losses Due to Sidewall Roughness in Microphotonic Waveguides: High Index-Contrast,” presented at CLEO/QELS 2005, Baltimore MD, May 22-27, 2005.