A method developed by the QNN Group with collaborators promises a way to make complex two-dimensional patterns by using sparse lithography in combination with self-assembly.  Such a technique could be useful for nanofabrication of integrated-circuit patterns, or patterns for solar cells, meta-materials, or other applications where complex two-dimensional nano-designs are needed. Congratulations to the authors JB Chang, Hong-Kyoon Choi, Adam Hannon, Caroline Ross, and Karl Berggren.

A copy of the patent can be found here.