PhD Student, EECS
Massachusetts Institute of Technology
Department of Electrical Engineering and Computer Science
50 Vassar St.
Cambridge, MA 02139
Donald (Donny) Winston is currently a graduate student in the M.I.T.
Department of Electrical Engineering and Computer Science. He received his Bachelor's degree in Electrical Engineering and Computer Sciences from the University of California at Berkeley in 2006. He researches methods of scanning-charged-particle-beam nanofabrication and uses hyphens extensively.
“Neon Ion Beam Lithography (NIBL),” Donald Winston , Vitor R Manfrinato , Samuel M Nicaise , Lin Lee Cheong , Huigao Duan , David Ferranti , Jeff Marshman , Shawn McVey , Lewis A Stern , John A Notte , and Karl Berggren, Nano Letters 11(10) 4343-4347(2011). [Nature Nanotechnology | Research Highlights].
“Modeling the point-spread function in helium-ion lithography,” D. Winston, J. Ferrera, L. Battistella, A. E. Vladár, K. K. Berggren,Scanning Available Online (2011).
“Sub-5 keV Electron-Beam Lithography in Hydrogen Silsesquioxane Resist,” Vitor R. Manfrinato, Lin Lee Cheong, Huigao Duan, Donald Winston, Henry I. Smith, Karl K. Berggren, Journal of Microelectronic Engineering 88(2011) 3070-3074.
“Sub-10-nm Half-Pitch Electron-Beam Lithography by Using PMMA as a Negative Resist,” Huigao Duan, Donald Winston, Joel K. W. Yang, Bryan M. Cord, Vitor R. Manfrinato, and Karl K. Berggren, Journal of Vacuum Science and Technology B 28 C6C58-C6C62 (2010).
“Metrology for electron-beam lithography and resist contrast at the sub-10nm scale,” Huigao Duan, Vitor R. Manfrinato, Joel K. W. Yang, Donald Winston, Bryan M. Cord, and Karl K. Berggren, Journal of Vacuum Science and Technology B vol. 28, no. 6, pp. H11-H17, (2010).
“Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist,” D. Winston, B. M. Cord, B. Ming, D. C. Bell, W. F. DiNatale, L. A. Stern, A. E. Vladar, M. T. Postek, M. K. Mondol, J. K. W. Yang, and K. K. Berggren, Journal of Vacuum Science and Technology B 27, pp. 2702-2706 (2009).