A key link required to realizing a vision of ubiquitous, inexpensive, sub-10-nanometer-length-scale patterning is the mass-production technique. At the moment, nanoimprint lithography is the only method under consideration that can reliably yield sub-10-nanometer structures. We are interested in both the challenge of making nanoimprint masters at such challenging length scales, and in taking advantage of the high resolution of nanoimprint not simply for pattern replication, but also for pattern generation. |
Recent Publications
Sub-10 nm Nanoimprint Lithography by Wafer Bowing
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We have teamed up with HP labs to demonstrate nanoimprint patterning of electron-beam-lithography-defined sub-10-nanometer-length-scale features, clearing a path towards manufacture of arbitrary and complex sub-10-nanometer structure. |
| Scanning-electron micrograph of imprinted sub-10-nm structures. |
Wei Wu, W.M. Tong, J. Bartman, Y. Chen, R. Walmsley, Z. Yu, Qiafeng Xia, I. Park, C. Picciotto, J. Gao, S.-Y. Wang, Deborah Morecroft, Joel K.W. Yang, Karl K. Berggren, and R. Stanley Williams, Nano Letters, ASAP Article, 10.1021/nl802295n, [abstract][postprint][publisher's version (may not be available to all viewers)]
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Pattern Generation by Using Multi-Step Room-Temperature Nanoimprint Lithography
Winner: Best Student Paper, IEEE Nano, 2006.
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Nanoimprint lithography is fundamentally a manufacturing technology, as opposed to a pattern-generation technology. But its impressive resolution capabilities (sub-10-nanometer) suggest that one approach--a sequence of carefully positioned imprints--might permit nanoimprint to become instead a method of achieving the ultimate in high-resolution (1-nanometer-length scale) pattern generation. In this paper, we examine this possibility. |
Scanning-electron micrograph of a near-arbitrary pattern formed by a sequence of room-temperature partial imprints. |
Stefan Harrer, Joel Yang, Giovanni Antonio Salvatore, Karl K. Berggren, Filip Ilievski, and Caroline A. Ross, IEEE Transactions on Nanotechnology, 6 639-644 (2007). |
Collaborators
- HP Laboratories
- Prof. Caroline Ross, MIT
Sponsors
- King Abdul Aziz City for Science and Technology (KACST) and Al'Faisal University
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