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ABOUT THE GROUP
The RLE Nanostructures Laboratory (NSL) develops techniques for fabricating surface structures with feature sizes in the range from nanometers to micrometers, and uses these structures in a variety of research projects. The NSL includes facilities for lithography (photo, interferometric, electron-beam, imprint, and x-ray), etching (chemical, plasma and reactive-ion), liftoff, electroplating, sputter deposition, and e-beam evaporation. Much of the equipment, and nearly all of the methods, utilized in the NSL are developed in house.
The research projects within the NSL falls into three major categories:
development of nanostructure fabrication technology;
nanomagnetics, microphotonics and templated self assembly;
periodic structures for x-ray optics, spectroscopy, atomic interferometry and nanometer metrology.
CURRENT PROGRESS REPORT CHAPTERS
2007 | No. 149
Nanostructures Technology, Research and Applications
2006 | No. 148
Nanostructures Technology, Research and Applications
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CURRENT GROUP NEWS
04.09.2009
It's a fine line: New method could lead to narrower chip patterns
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