• Home
  • About
    • News
    • Mission Statement
    • Research Today
    • History
      • The RLE Incubator
      • Timeline: 1946–1959
      • Timeline: 1960–1979
      • Timeline: 1980–1999
      • Timeline: 2000-Today
      • Past Directors
  • People
    • Principal Investigators
    • RLE Headquarters
    • Administrative Assistants
    • General Staff Directory
  • Research
    • Major Themes
    • Research Groups
    • Sponsors
    • RLE Research Services
  • Services
    • Online Resources
    • Finance and Sponsored Programs
    • Administration and Human Resources
    • Office of the Director
    • Information Systems and Networking
    • EHS
    • Strategic Communications & Media Design
    • T.J. Rodgers RLE Laboratory
    • FAQ
  • Contact
    • Maps and Directions
Reasserting U.S. leadership in microelectronics

Reasserting U.S. leadership in microelectronics

by RLE at MIT | Jan 19, 2022 | RLE News Articles

This image shows the CMOS THz-ID chip. The chip is a collaboration between Profs. Ruonan Han and Anantha P. Chandrakasan. Image courtesy of the researchers; edited by MIT News. By Adam Zewe | MIT News Office The global semiconductor shortage has...
Associate Professor of EECS Max Shulaker Named 2021 Moore Inventor Fellow

Associate Professor of EECS Max Shulaker Named 2021 Moore Inventor Fellow

by RLE at MIT | Oct 29, 2021 | News Links

Associate Professor of EECS Max Shulaker was named a 2021 Moore Inventor Fellow on October 4th by the Gordon and Betty Moore Foundation. «more» Related Links: Professor Max Shulaker Novel Electronic Systems Group Associate Professor of EECS Max...
Carbon Nanotubes for Radiation-Tolerant Electronics

Carbon Nanotubes for Radiation-Tolerant Electronics

by RLE at MIT | Oct 27, 2021 | RLE Recent Papers

Pritpal S. Kanhaiya, Andrew Yu, Richard Netzer, William Kemp, Derek Doyle, Max M. Shulaker https://doi.org/10.1021/acsnano.1c04194 Abstract: Electronics for space applications have stringent requirements on both performance and radiation tolerance....
Fabrication of carbon nanotube field-effect transistors in commercial silicon manufacturing facilities

Fabrication of carbon nanotube field-effect transistors in commercial silicon manufacturing facilities

by RLE at MIT | Jun 1, 2020 | RLE Recent Papers

Mindy D. Bishop, Gage Hills, Tathagata Srimani, Christian Lau, Denis Murphy, Samuel Fuller, Jefford Humes, Anthony Ratkovich, Mark Nelson & Max M. Shulaker DOI: 10.1038/s41928-020‑0419‑7 Abstract: Carbon...
Fabrication of carbon nanotube field-effect transistors in commercial silicon manufacturing facilities

Carbon nanotube transistors make the leap from lab to factory floor

by RLE at MIT | Jun 1, 2020 | News Links

Technique paves the way for more energy efficient, 3D microprocessors. «more» Related Links: Carbon nanotube transistors make the leap from lab to factory floor (MIT News) Professor Max Shulaker Novel Electronic...
« Older Entries
Copyright © 2025 – RLE at MIT – all rights reserved – Accessibility
  • Follow
  • Follow
  • Follow
  • Follow